Abstract
In order to perform a 3D TCAD simulation, we first need the mask layout for all the process steps. The mask layout can be designed in a variety of software including drafting tools like Autodesk AutoCAD® and specialized EDA tools like Cadence Virtuoso® and Tanner L-Edit®. These tools are used to create a GDSII file (.gds) which is the current industry standard for IC layout work. The GDS format was originally developed by a California company called Calma for its layout design software, “Graphic Data System” (“GDS”) and later, “GDS II”. This format is now owned by Cadence Design Systems. Objects contained in a GDS II file are grouped by assigning them various attributes including layer number, data type or text type [52].
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© 2012 Springer Science+Business Media, LLC
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Li, S., Fu, Y. (2012). Setting Up a 3D TCAD Simulation. In: 3D TCAD Simulation for Semiconductor Processes, Devices and Optoelectronics. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-0481-1_4
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