Photo-Induced Oxidation Processes in Silicon

  • E. Fogarassy

Abstract

We review in this paper the different ways which have been explored to photo-induce oxidation of silicon using CW and pulsed lasers of different wavelengths working both in solid and liquid phase regimes. The specific influence of visible and ultraviolet intense light sources on the oxidation processes will be detailed with special attention to the non thermal effects suggested to be present when using UV photons of high energy (> 3.5 eV).

Keywords

Furnace Dioxide Arsenic Ozone Fluorine 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    S.W. Chiang, Y.S. Liu and R.F. Reihl, Appl. Phys. Lett. 39:752 (1981).CrossRefGoogle Scholar
  2. 2.
    J.F. Gibbons, Jpn. J. Appl. Phys. Suppl. 19:121 (1980).Google Scholar
  3. 3.
    I.W. Boyd, J.I.B. Wilson, J.L. West, Thin Solid Filsm 83:L173 (1981).CrossRefGoogle Scholar
  4. 4.
    I.W. Boyd and J.I.B. Wilson, Appl. Phys. Lett. 41:162 (1982).CrossRefGoogle Scholar
  5. 5.
    I.W. Boyd, Appl. Phys. Lett. 42:728 (9183).CrossRefGoogle Scholar
  6. 6.
    C. Fiori, Phys. Rev. Lett., 52:23, 2077 (1984).CrossRefGoogle Scholar
  7. 7.
    J. Siejka, R. Srinivasan, J. Perrière “Dielectric Layers in Semiconductors”: Novel Technologies and Devices” E. MRS, ed. by G.G. Bentini, E. Fogarassy, A. Golanski, Les Editions de Physique, Les Ulis, (1986) p. 213.Google Scholar
  8. 8.
    E. Fogarassy, A. Slaoui and C. Fuchs, to be published in the NATO Proc. Workshop on “Emerging Technologies for in situ Processing”, (Cargesse, May 1987).Google Scholar
  9. 9.
    G. Battaglin, G. Della Mea, A.V. Drigo, C. Foti, G.G. Bentini and M. Servidori, Phys. Status Solidi (a) 49:347 (1978).CrossRefGoogle Scholar
  10. 10.
    K. Hoh, H. Koyama, K. Uda and Y. Miura, Jpn. J. Appl. Phys., 19:L375 (1980).CrossRefGoogle Scholar
  11. 11.
    Y.S. Liu, S.W. Chiang and F. Bacon, Appl. Phys. Lett. 38:1005 (1981).CrossRefGoogle Scholar
  12. 12.
    A. Cros and F. Salvan, Appl. Phys. A28:24l (1982).Google Scholar
  13. 13.
    T.E. Orlowski and H. Richter, Appl. Phys. Lett. 45:241 (1984).CrossRefGoogle Scholar
  14. 14.
    E. Fogarassy, C.W. White, D.H. Lowndes and J. Narayan, “Beam Solid Interactions and Phase Transformations”, ed. by H. Kurz, G.L. Olson and J.M. Poate, 51:173 (1985).Google Scholar
  15. 15.
    G.G. Bentini, M. Berti, A.V. Drigo, E. Jannitti, C. Cohen and J. Siejka, “Laser Chemical Processing of Semiconductor Devices” extended Abstracts p. 126 ed. by F.A. Houle, T.F. Deutsch, R.M. Osgood Jr. (1984).Google Scholar
  16. 16.
    S.E. Blum, K.H. Brown and R. Srinivassan, Appl. Phys. Lett. 43:1026 (1983).CrossRefGoogle Scholar
  17. 17.
    E. Fogarassy, S. Unamuno, J.L. Regolini and C. Fuchs, Phil. Mag. B55:253 (1987).Google Scholar
  18. 18.
    H.S. Carslaw and J.C. Jaeger, “Conduction of Heat in Solids”, 2nd edit. Clarendon Press, Oxford (1959).Google Scholar
  19. 19.
    J.L. Regolini, see R. Srinivasan, J. Perrière “Dielectric Layers in Semiconductors”: Novel Technologies and Devices” E. MRS, ed. by G.G. Bentini, E. Fogarassy, A. Golanski, Les Editions de Physique, Les Ulis, (1986) Ref. 7, P. 297.Google Scholar
  20. 20.
    E.M. Young and W.A. Tiller, Appl. Phys. Lett. 42:63 (A983).Google Scholar
  21. 21.
    I.W. Boyd and F. Michelli, see A. Slaoui and C. Fuchs, to be published in the NATO Proc. Workshop on “Emerging Technologies for in situ Processing”, (Cargesse, May 1987) Ref. 8.Google Scholar
  22. 22.
    R. Oren and S.K. Ghandhi, J. Appl. Phys. 42:752 (1971).CrossRefGoogle Scholar
  23. 23.
    S.A. Schafer and S.A. Lyon, J. Vac. Sci. Technol. 21:422 (1982).CrossRefGoogle Scholar
  24. 24.
    A.M. Goodman, Phys. Rev. 152:785 (1966).CrossRefGoogle Scholar
  25. 25.
    C. Fiori and R.A.B. Devine, Phys. Rev. Lett. 52:2081 (1984).CrossRefGoogle Scholar
  26. 26.
    I.W. Boyd and J.I.B. Wilson, Appl. Phys. Lett. 50:320 (1987).CrossRefGoogle Scholar
  27. 27.
    S.M. Sze, “Physics of Semiconductor Devices”, J. Wiley and Sons, N.Y., (1969).Google Scholar

Copyright information

© Plenum Press, New York 1988

Authors and Affiliations

  • E. Fogarassy
    • 1
  1. 1.Centre de Recherches Nucléaires — Laboratoire PhaseStrasbourg CedexFrance

Personalised recommendations