Dielectric Behaviour of Amorphous Thin Films
Dielectric behaviour and ultramicrostructures of r.f. sputtered films are examined in as-sputtered and crystallized conditions. LiNbO3, K3Li2Nb5O15, KTaO3 and KH2PO4, amorphous films with high dielectric constants and exhibit ferroelectric-like dielectric anomalies. This apparently universal dielectric behaviour of thin ionic films is examined using a cluster model. Anharmonicity in the vibrations of particles in the tissue region of the films is considered to be the possible origin of the dielectric behaviour.
KeywordsCrystallization Quartz Manifold Argon Expense
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