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Chemical Amplification in the Design of Radiation-Sensitive Polymers

  • J. M. J. Fréchet
  • F. M. Houlihan
  • F. Bouchard
  • E. Eichler
  • A. Hult
  • R. Allen
  • S. MacDonald
  • H. Ito
  • C. G. Willson

Abstract

Approaches to the design of resist materials which incorporate chemical amplification have been directed toward three different areas:
  • Synthesis of polymers which undergo radiation-induced modification of side-chain polarity in a catalytic process

  • Synthesis of thermally depolymerizable polycarbonates designed to provide imaging via an acid catalyzed multiple chain-scission process

  • Development of a imagewise film-deposition technique via photoinitiated interfacial cationic polymerization

All three processes rely on the photogeneration of a catalytic amount of acid within a polymer coating which initiates a cascade of chemical reactions. This results in a resist system with high sensitivity

Keywords

Latent Image Onium Salt Inert Polymer Unexposed Area Chemical Amplification 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • J. M. J. Fréchet
    • 1
    • 2
  • F. M. Houlihan
    • 1
  • F. Bouchard
    • 1
  • E. Eichler
    • 1
  • A. Hult
    • 3
  • R. Allen
    • 3
  • S. MacDonald
    • 3
  • H. Ito
    • 3
  • C. G. Willson
    • 3
  1. 1.Department of ChemistryUniversity of OttawaOttawaCanada
  2. 2.Department of ChemistryCornell UniversityIthacaUSA
  3. 3.IBM Research DivisionAlmaden Research CenterSan JoseUSA

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