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Implications of Particulate Contamination in E-Beam Lithography

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Particles on Surfaces 2

Abstract

Experiments were made to compare chromium spot and pinhole defects on finished photomasks written with Manufacturing Electron Beam Lithography Systems (MEBES®). The experiments were performed while adding particulate contamination naturally during blank manufacture, packaging, storage, and by the writing process. In addition, particulate contamination that was added purposely before or after exposure was compared to chromium spot and pinhole defects found on finished experimental plates.

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References

  1. K. Milner, Paper presented at MEBES Users Group meeting, Monterey, CA, January 1985.

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Author information

Authors and Affiliations

  1. Electron Beam Technology, Perkin-Elmer Corporation, 26460 Corporate Avenue, Hayward, California, 94545, USA

    Robert L. Dean

Authors
  1. Robert L. Dean
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Editor information

Editors and Affiliations

  1. IBM U.S. Technical Education, 500 Columbus Ave., 10594, Thornwood, NY, USA

    K. L. Mittal

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© 1989 Plenum Press, New York

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Dean, R.L. (1989). Implications of Particulate Contamination in E-Beam Lithography. In: Mittal, K.L. (eds) Particles on Surfaces 2. Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-0531-6_21

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  • DOI: https://doi.org/10.1007/978-1-4613-0531-6_21

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4612-7852-8

  • Online ISBN: 978-1-4613-0531-6

  • eBook Packages: Springer Book Archive

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