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Defect Structure in Low and High Misfit Systems

  • Horst P. Strunk
Part of the NATO ASI Series book series (NSSB, volume 203)

Abstract

One of the most important concerns in semiconductor heteroepitaxy is the formation of dislocations and similar defects as a result of misfit stresses. In general these defects are harmful to the electronic/optonic properties of the material and the primary interest is to avoid the defects; where not possible, as an alternative, mechanisms are to be found that reduce the defect density or the presence of defects should be restricted to areas, where they may be tolerated. Unfortunately, the mechanisms that operate to nucleate, multiply and propagate dislocations depend in many cases on the heteroepitaxial system under consideration; especially the degree of misfit, growth temperature and growth mechanism may influence the motion of dislocations and thus the defect structure that develops in the system.

Keywords

Burger Vector Critical Thickness Misfit Dislocation Liquid Phase Epitaxy Dislocation Segment 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • Horst P. Strunk
    • 1
  1. 1.Technical University Hamburg-HarburgHamburg 90Germany

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