Advances in Thin Film Nanoindentation
A new model of thin film indentation that accounted for an apparent discontinuity in elastic strain transfer at the film/substrate interface was developed. Finite element analysis suggested that numerical values of strain were not directly continuous across the interface; the values in the film were higher when a soft film was deposited on a hard substrate. The new model was constructed based on this discontinuity; whereby, separate weighting factors were applied to account for the influence of the substrate in strain developed in the film and vice-versa. By comparing the model to experimental data from thirteen different amorphous thin film materials on a silicon substrate, constants in each weighting factor were found to have physical significance in being numerically similar to the bulk scale Poisson’s ratios of the materials involved. When employing these material properties in the new model it was found to provide an improved match to the experimental data over the existing Doerner and Nix and Gao models. Finally, the model was found to be capable of assessing the Young’s modulus of thin films that do not exhibit a flat region as long as the bulk Poisson’s ratio is known.
KeywordsSilicon Substrate Indent Depth Discontinuous Model Continuous Stiffness Measurement Giant Magnetostrictive Material
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