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Statistical Nano CMOS Variability and Its Impact on SRAM

  • Asen Asenov
Chapter
Part of the Integrated Circuits and Systems book series (ICIR)

Abstract

The years of “happy scaling” are over and the fundamental challenges that the semiconductor industry faces at technology and device level will deeply affect the design of the next generations of integrated circuits and systems. The progressive scaling of CMOS transistors to achieve faster devices and higher circuit density has fueled the phenomenal success of the semiconductor industry – captured by Moore’s famous law [1]. Silicon technology has entered the nano CMOS era with 35-nm MOSFETs in mass production in the 45-nm technology generation. However, it is widely recognised that the increasing variability in the device characteristics is among the major challenges to scaling and integration for the present and next generation of nano CMOS transistors and circuits. Variability of transistor characteristics has become a major concern associated with CMOS transistors scaling and integration [2, 3]. It already critically affects SRAM scaling [4], and introduces leakage and timing issues in digital logic circuits [5]. The variability is the main factor restricting the scaling of the supply voltage, which for the last four technology generations has remained virtually constant, adding to the looming power crisis.

Keywords

Threshold Voltage Statistical Variability SRAM Cell Equivalent Oxide Thickness CMOS Transistor 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer US 2010

Authors and Affiliations

  1. 1.Department of Electronics and Electrical EngineeringThe University of GlasgowGlasgowUK

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