Summary
This paper describes a method to map dopant distributions in compound semiconductors by off-axis electron holography. A cross-sectional transmission electron microscopy (TEM) specimen with n+, n− and p gallium arsenide thin films was prepared using the micro-sampling technique of a focused ion beam and Ar+ ion milling. A phase map was obtained by off-axis phase-shifting electron holography, and the dopant distributions across a p–n junction are clearly observed. Furthermore, the low and high dopant concentration regions are remarkably distinguished with high contrast.
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Sasaki, H., Ootomo, S., Matsuda, T., Yamamoto, K., Hirayama, T. (2008). Observation of Dopant Distribution in Compound Semiconductors Using Off-axis Electron Holography. In: Cullis, A.G., Midgley, P.A. (eds) Microscopy of Semiconducting Materials 2007. Springer Proceedings in Physics, vol 120. Springer, Dordrecht. https://doi.org/10.1007/978-1-4020-8615-1_85
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DOI: https://doi.org/10.1007/978-1-4020-8615-1_85
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-4020-8614-4
Online ISBN: 978-1-4020-8615-1
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