Investigation of Compressive Strain Effects Induced by STI and ESL

  • S. Zaouia
  • S. Cristoloveanu
  • A. H. Perera
Part of the NATO Science for Peace and Security Series B: Physics and Biophysics book series (NAPSB)

Two types of mechanical stress, induced by compressive etch stop layer (c-ESL) and/or shallow trench isolation (STI), are examined in advanced p-channel partially depleted SOI MOSFETs. Systematic measurements show that c-ESL significantly enhances the performance of PMOS devices without degrading the short-channel effects. The mechanical stress induced by c-ESL is inhomogeneous through the Si film, decreasing from the top to the bottom interface. We demonstrate that the combination of c-ESL and STI stress is a complex 3-D mechanism, which depends on the layout parameters: channel width (from 0.1 to 1 µm), channel length (down to 23 nm) and source/drain active surface.

Keywords

Nickel Attenuation Cobalt Boron Nitride 

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Copyright information

© Springer 2007

Authors and Affiliations

  • S. Zaouia
    • 1
    • 2
  • S. Cristoloveanu
    • 2
  • A. H. Perera
    • 1
  1. 1.Freescale semiconductorFrance
  2. 2.IMEP, MINATECFrance

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