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Semiconductor Process Technologies

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The Electronic Design Automation Handbook
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Abstract

Approximately up to the year 1970 integrated circuits were realized mainly in bipolar technology. Though the basics of MOS technology already were known, the reproducibility of the threshold voltages of MOS-Field Effect Transistors (MOSFET) was insufficient. The problem could be solved, however, with the breakthrough of the ionimplantation technology. Since that time MOS is the dominating technology for the production of integrated circuits.

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References

  1. Clauss, H.: ‘Probleme der Aluminium-Metallisierung bei Halbleiterbauelementen’. In ‘Hochvakuum und Dünne Schichten’, IEZ, München, 1973

    Google Scholar 

  2. Clauss, H.: ‘Physik der Fehlerursachen an Halbleiterbauelementen’. AEG-Telefunken, BMFT-Forschungsbericht T 76–77 (1976), pp. 26–55

    Google Scholar 

  3. Clauss, H.: ‘Physik der Fehlerursachen an Halbleiterbauelementen’. AEG-Telefunken, BMFT-Forschungsbericht T 76–77 (1976), p. 40

    Google Scholar 

  4. Goser, K.: ‘Großintegrationstechnik’. Bd. 1.–Heidelberg: Hüthig Buchverlag, 1990, p. 86

    Google Scholar 

  5. Hoffmann, K.: ‘VLSI-Entwurf’.–München; Wien: R. Oldenbourg Verlag, 1998,p. 313

    Google Scholar 

  6. Hofker, W. K.: Philips Res. Rep. Suppl. 8(1975)

    Google Scholar 

  7. Laker, K. R.; Sansen, W. M. C.: ‘Design of Analog Integrated Circuits and Systems’.–New York: McGraw-Hill Inc., 1994, pp. 156–162

    Google Scholar 

  8. Klar, H.: ‘Integrierte Digitale Schaltungen MOS/BICMOS’.–Berlin: Springer-Verlag, 1996, p. 42

    Google Scholar 

  9. Lie, L. N.; Razouk, R. R.; Deal, B. E.: ‘High Pressure Oxidation of Silicon in Dry Oxygen’. J. E.ectrochem. Soc. 129 (1982), pp. 2828–2834

    Article  Google Scholar 

  10. Murari, B.; Bertotti, F.; Vignola, G. A.: ‘Smart Power ICs’. –— Berlin: Springer-Verlag, 1996, p. 13 ff.

    Google Scholar 

  11. Parillo, L. C.: ‘VLSI Process Integration’. In S. M. Sze, Ed., VLSI Technology. –New York: McGraw-Hill, 1989

    Google Scholar 

  12. Rein, H.-M.; Ranft, R.: ‘Integrierte Bipolarschaltungen’.–Berlin: Springer-Verlag, 1980, p. 58

    Google Scholar 

  13. Rein, H.-M.; Ranft, R.: ‘Integrierte Bipolarschaltungen’.–Berlin: Springer-Verlag, 1980, p. 38

    Google Scholar 

  14. Rein, H.-M.; Ranft, R.: ‘Integrierte Bipolarschaltungen’.–Berlin: Springer-Verlag, 1980, p. 75

    Google Scholar 

  15. Schumicki, G.; Seegebrecht, P.: Prozesstechnologie. –Berlin: Springer-Verlag, 1991, p. 56 ff.

    Google Scholar 

  16. Schumicki, G.; Seegebrecht, P.: Prozesstechnologie. –— Berlin: Springer-Verlag, 1991, p. 245

    Book  Google Scholar 

  17. Schumicki, G.; Seegebrecht, P.: Prozesstechnologie. –— Berlin: Springer-Verlag, 1991, p. 249

    Book  Google Scholar 

  18. Schumicki, G.; Seegebrecht, P.: Prozesstechnologie. –— Berlin: Springer-Verlag, 1991, p. 219

    Book  Google Scholar 

  19. Schumicki, G.; Seegebrecht, P.: Prozesstechnologie. –— Berlin: Springer-Verlag, 1991, p. 251

    Book  Google Scholar 

  20. Schumicki, G.; Seegebrecht, P.: Prozesstechnologie. –— Berlin: Springer-Verlag, 1991, p. 231 ff.

    Google Scholar 

  21. Widmann, D.; Mader, H.; Friedrich, H.: ‘Technologie hochintegrierter Schaltungen’. –Berlin: Springer-Verlag, 1988, p. 301 ff.

    Google Scholar 

  22. Widmann, D.; Mader, H.; Friedrich, H.: ‘Technologie hochintegrierter Schaltungen’. –Berlin: Springer-Verlag, 1988, p. 67 ff.

    Google Scholar 

  23. Widmann, D.; Mader, H.; Friedrich, H.: ‘Technologie hochintegrierter Schaltungen’. –Berlin: Springer-Verlag, 1988, p. 301

    Google Scholar 

  24. Ziegler, J. F.; Biersack, J. P.; Littmark, J.: ‘The Stopping and Range of Ions in Solids’.–Pergamon Press, 1985

    Google Scholar 

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© 2003 Springer Science+Business Media New York

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Clauss, H. (2003). Semiconductor Process Technologies. In: Jansen, D. (eds) The Electronic Design Automation Handbook. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-73543-6_19

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  • DOI: https://doi.org/10.1007/978-0-387-73543-6_19

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4419-5369-8

  • Online ISBN: 978-0-387-73543-6

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