Abstract
The dedicated photolithography machine constraint in semiconductor manufacturing is one of the new issues of photolithography machinery due to natural bias. In this paper, we propose the heuristic Load Balancing (LB) scheduling approach based on a Resource Schedule and Execution Matrix (RSEM) to tackle this constraint. The LB method is to schedule each wafer lot at the first photolithography stage to a suitable machine, according to the load balancing factors among machines. We describe the proposed LB scheduling method and present an example to demonstrate the proposed method and the result of the simulations to validate the approach.
Keywords
- Load Balance
- Semiconductor Manufacturing
- Process Pattern
- Schedule Approach
- Schedule Rule
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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7. References
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Shr, A., Liu, A., Chen, P.P. (2006). A Load Balancing Method for Dedicated Photolithography Machine Constraint. In: Information Technology For Balanced Manufacturing Systems. BASYS 2006. IFIP International Federation for Information Processing, vol 220. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-36594-7_36
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DOI: https://doi.org/10.1007/978-0-387-36594-7_36
Publisher Name: Springer, Boston, MA
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