Abstract
A natural application of the emerging technique of photoemission microscopy to the study of semiconductor interfaces is direct determination of heterojunction parameters by measuring the device in cross section. We present here results on p-n GaAs homojunctions, which served as a prototype system to demonstrate the applicability of this novel technique to buried semiconductor interfaces. We also describe preliminary measurements of the electrostatic potential profile across Al/GaAs Schottky junctions.
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Barbo, F. et al. (2002). Cross-Sectional Photoemission Spectromicroscopy of Semiconductor Heterostructures. In: Watanabe, Y., Salviati, G., Heun, S., Yamamoto, N. (eds) Nanoscale Spectroscopy and Its Applications to Semiconductor Research. Lecture Notes in Physics, vol 588. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-45850-6_11
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DOI: https://doi.org/10.1007/3-540-45850-6_11
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