Abstract
A minimal stochastic field equation aimed at modeling the amorphous surface growth generated by physical vapor deposition is derived, analyzed, and related to the underlying microscopic mechanisms.
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Linz, S.J., Raible, M., Hānggi, P. (2000). Stochastic Field Equation for Amorphous Surface Growth. In: Freund, J.A., Pöschel, T. (eds) Stochastic Processes in Physics, Chemistry, and Biology. Lecture Notes in Physics, vol 557. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-45396-2_42
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DOI: https://doi.org/10.1007/3-540-45396-2_42
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