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3.8 Further Reading and References
Optics and Ellipsometry
R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, (North-Holland, Amsterdam, 1977).
M. Born and E. Wolf, Principles of Optics, Sixth Edition Cambridge, University Press, 1980.
P. S. Hauge, “Recent developments in instrumentation in ellipsometry,” Surf. Sci. 96, 108–140 (1980).
E. Palik (ed.), Handbook of optical constants of solids, Academic Press, Orlando, 1985; Handbook of optical constants of solids, II Academic Press, Boston, 1991; Handbook of optical constants of solids, III Academic Press, Boston, 1998.
P. Yeh, Optical Waves in Layered Media, Wiley, New York, (1988).
D. S. Kliger, J. W. Lewis, and C. E. Randall, Polarized Light in Optics and Spectroscopy, (Academic Press, New York) (1990).
H. G. Tompkins, A User’s Guide to Ellipsometry, Academic Press, New York, 1993.
H. G. Tompkins and W. A. McGahan, Spectroscopic Ellipsometry and Reflectometry: A User’s Guide, John Wiley & Sons, New York, 1999.
Spectroscopic Ellipsometry, Thin Solid films, 233–234 (1993); Spectroscopic Ellipsometry, Thin Solid films, 313–314 (1998). (Proceedings of the first and second International Conferences on Spectroscopic Ellipsometry)
R. A. Chipman, “Polarimetry” Handbook of Optics, Vol. II, (2nd edition, McGraw-Hill, New York, 1995), Chapter 22.
R. M. A. Azzam, “Ellipsometry” Handbook of Optics, Vol. II, (2nd edition, McGraw-Hill, New York, 1995), Chapter 27.
U. Rossow and W. Richter, “Spectroscopic ellipsometry,” Optical characterization of epitaxial semiconductor layers, (Springer-Verlag, Berlin, G. Bauer and W. Richter, eds. 1996), p. 68–128.
C. Brosseau, Fundamentals of Polarized Light: A Statistical Optics Approach, Wiley, New York, 1998.
Data Reduction
P. R. Bevington, Data Reduction and Error Analysis for the Physical Sciences, McGraw-Hill, New York, 1969.
Y. Bard, Nonlinear Parameter Estimation, Academic Press, New York, 1970.
N. R. Draper and H. Smith, Applied Regression Analysis, Wiley, New York, 1981.
W. H. Press, B. P. Flannery, S. A. Teukolsky and W. T. Vetterling, Numerical Recipes, Second Edition, Cambridge, University Press, 1992.
Numbered References
R. Barakat, “Bilinear constraints between elements of the 4 × 4 Mueller-Jones transfer matrix of polarization theory,” Opt. Commun., 38 159 (1981).
G. E. Jellison, Jr. “The calculation of thin film parameters from spectroscopic ellipsometry data,” Thin Solid Films, 290–291, 40–45 (1996).
F. Abelès, Ann. de Physique, 5, 596 (1950).
D. W. Berreman, “Optics in stratified and anisotropic media: 4 × 4-matrix formulation,” J. Opt. Soc. Am., 72, 502–510 (1972).
P. J. Lin-Chung and S. Teitler, “4 × 4 matrix formalisms for optics in stratified anisotropic media,” J. Opt. Soc. Am. A, 1, 703–705 (1984).
H. Wohler, G. Hass, M. Fritsch, and D. A. Mlynski, “Faster 4 × 4 matrix method for uniaxial inhomogeneous media,” J. Opt. Soc. Am., A 5, 1554 (1988); H. Wohler, M. Fritsch, G. Hass, and D. A. Mlynski, “Characteristic matrix method for stratified anisotropic media: optical properties of special configurations,” J. Opt. Soc. Am., A, 8, 536–540 (1991).
R. Jacobsson, in E. Wolf (ed.) Progress in Optics, 5, Wiley, 1965, p. 247.
A. R. Forouhi and I. Bloomer, “Optical dispersion relations for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B, 34, 7018–7026 (1986).
G. E. Jellison, Jr. and F. A. Modine, “Parameterization of the optical functions of amorphous materials in the interband region,” Appl. Phys. Lett., 69, 371–373 (1996); ibid 69, 2137 (1996).
J. Tauc, R. Grigorovici, and A. Vancu, Phys. Stat. Solidi, 15, 627 (1966).
S. Adachi, “Optical dispersion relations in amorphous semiconductors,” Phys. Rev. B, 43, 12316–12321 (1991).
T. Yamaguchi, Y. Kaneko, A. H. Jayalissa, Aoyama, A. vb. Zotov, and V. G. Lifshits, “Empirical dielectric function of amorphous materials for spectroscopic ellipsometry,” J. Appl. Phys., 77, 4673–4676 (1995).
D. E. Aspnes, “Modulation spectroscopy/ electric field effects on the dielectric function of semiconductors,” Handbook on Semiconductors, Vol 2, (North Holland, New York, M. Balkanski, ed. 1980), p. 109–154; P. Y. Yu and M. Cardona, Fundamentals of Semiconductors, (Springer-Verlag, Berlin, 1996).
F. L. Terry, Jr. “A modified harmonic oscillator approximation scheme for the dielectric constants of AlxGa1−xAs,” J. Appl. Phys., 70, 409–417 (1991); P. G. Snyder, J. A. Woollam, S. A. Alterovitz, and B. Johs, J. Appl. Phys., 68, 5925 (1990).
R. J. Elliott, Phys. Rev. 108, 1384 (1957); T. Holden, P. Ram, F. H. Pollak, J. L. Freeouf, B. X. Yang, and M. C. Tamargo, Phys. Rev. B, 56, 4037 (1997); G. E. Jellison, Jr. and L. A. Boatner, “Optical functions of uniaxial ZnO determined by generalized ellipsometry,” Phys. Rev. B, 58, 3586–3589 (1998); ibid, 65, 049902(E) (2002).
B. Johs, C. M. Herzinger, J. H. Dinan, A. Cornfield, and J. D. Benson, “Development of a parametric optical constant model for Hg1−xCdxTe for control of composition by spectroscopic ellipsometry during MBE growth,” Thin Solid Films, 313–314, 137–142 (1998).
D. E. Aspnes, “Optical properties of thin films,” Thin Solid Films, 89, 249–262 (1982).
P. H. Roussel, J. Vanhellemont, H. E. Maes, “Numerical aspects of the implementation of effective-medium approximation models in spectroscopic ellipsometry regression software,” Thin Solid Films, 234, 423–427 (1993).
S. Y. Kim and K. Vedam, “Proper choice of the error function in modeling spectroellipsometric data,” Appl. Opt, 25, 2013–2021 (1986).
G. E. Jellison, Jr., “Optical functions of silicon determined by two-channel polarization modulation ellipsometry,” Opt. Materials, 1, 41–47 (1992).
G. E. Jellison, Jr., M. F. Chisholm, and S. M. Gorbatkin, “Optical functions of vapor-deposited thin-film silicon determined by spectroscopic ellipsometry,” Appl. Phys. Lett., 62, 3348–3350 (1993).
G. E. Jellison, Jr. and J. W. McCamy, “Sample depolarization effects from thin films of ZnS on GaAs as measured by spectroscopic ellipsometry,” Appl. Phys. Lett., 61, 512–514 (1992).
R. Joerger, K. Forcht, A. Gombert, M. Kohl, and W. Graf, “Influence of incoherent superposition of light on ellipsometric coefficients,” Appl. Opt., 36, 319–327 (1997).
S. Krishnan, and P. C. Nordine, Mueller-matrix ellipsometry using the division-of-amplitude photopolarimeter: a study of depolarization effects,” Appl. Opt., 33, 4184–4192 (1994).
S. Pittal, P. G. Snyder, and N. Ianno, “Ellipsometry study of non-uniform lateral growth of ZnO thin films,” Thin Solid Films, 233, 286–288 (1993).
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Jellison, G.E. (2005). Data Analysis for Spectroscopic Ellipsometry. In: Tompkins, H.G., Irene, E.A. (eds) Handbook of Ellipsometry. Springer, Berlin, Heidelberg . https://doi.org/10.1007/3-540-27488-X_3
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