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Nano-Optical Media for Ultrahigh-Density Storage

  • K. Naito
  • H. Hieda
  • T. Ishino
  • K. Tanaka
  • M. Sakurai
  • Y. Kamata
  • S. Morita
  • A. Kikitsu
  • K. Asakawa
Part of the Springer Series in Optical Sciences book series (SSOS, volume 96)

Keywords

Bias Voltage Diblock Copolymer Charge Injection Groove Width Spiral Pattern 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    Modified by K.N. from the roadmap (Fig. 2.3.1.1) In: Research survey on near-field light technology, OITDA (2000)Google Scholar
  2. 2.
    S.Y. Chou, M.S. Wei, P.R. Krauss, P.B. Fisher: J. Appl. Phys. 76, 6673 (1994)CrossRefADSGoogle Scholar
  3. 3.
    R.L. White, R.M.H. New, RE.F.W. Pease: IEEE Trans. Magn. 33, 990 (1997)CrossRefADSGoogle Scholar
  4. 4.
    R.L. White: J. Magn. Magn. Mater. 209, 1 (2000)CrossRefADSGoogle Scholar
  5. 5.
    C.T. Rettner, M.E. Best, B.D. Terris: IEEE Trans. Magn. 37, 1649 (2001)CrossRefADSGoogle Scholar
  6. 6.
    C. Chappert, H. Bernas, J. Ferre, V. Kottler, J.-P. Jamet, Y. Chen, E. Cambril, T. Devolder, F. Rousseaux, V. Mathet, H. Launois: Science 280, 1919 (1998)CrossRefADSGoogle Scholar
  7. 7.
    C.A. Ross, H.I. Smith, T. Savas, M. Schattenburg, M. Farhoud, M. Hwang, M. Walsh, M.C. Abraham, R.J. Ram: J. Vac. Sci. Technol. B. 17, 3168 (1999)CrossRefGoogle Scholar
  8. 8.
    B. Cui, W. Wu, L. Kong, X. Sun, S.Y. Chou: L. Appl. Phys. 85, 5534 (1999)ADSGoogle Scholar
  9. 9.
    T. Thurn-Albrecht, J. Schotter, G.A. Kästle, N. Emley, T. Shibauchi, L. Krusin-Elbaum, K. Guarini, C.T. Black, M.T. Tuominen, T.P. Russell: Science 290, 2126 (2000)CrossRefADSGoogle Scholar
  10. 10.
    K. Nielsch, F. Muller, A.-P Li, U. Gosele: Adv. Mater. 12, 582 (2000)CrossRefGoogle Scholar
  11. 11.
    K. Naito, H. Hieda, M. Sakurai, Y. Kamata, K. Asakawa: IEEE Trans. Magn. 38, 1949 (2002)CrossRefADSGoogle Scholar
  12. 12.
    R.A. Segalman, H. Yokoyama, E.J. Kramer: Adv. Mater. 13, 1152 (2001)CrossRefGoogle Scholar
  13. 13.
    E. Betzig, J.K. Trautman, R. Wolfe, E.M. Gyorgy, P.L. Finn, M.H. Kryder, C.-H. Chang: Appl. Phys. Lett. 61, 142 (1992)CrossRefADSGoogle Scholar
  14. 14.
    S. Hosaka, T. Shintani, M. Miyamoto, A. Hirotsune, M. Terao, M. Yoshida, S. Honma, S. Kammer: Thin Solid Films 273, 122 (1996)CrossRefADSGoogle Scholar
  15. 15.
    S. Jiang, J. Ichihashi, H. Monobe, M. Fujihira, M. Ohtsu: Opt. Commun. 106, 173 (1994)CrossRefADSGoogle Scholar
  16. 16.
    M. Hamano, M. Irie: Rev. Laser Eng. 24, 1045 (1996) (in Japanese)Google Scholar
  17. 17.
    H. Hieda, K. Tanaka, N. Gemma: J. Appl. Phys. 40, 1071 (2001)CrossRefGoogle Scholar
  18. 18.
    N. Gemma, H. Hieda, K. Tanaka, S. Egusa: Jpn. J. Appl. Phys. 34, L859 (1995)CrossRefADSGoogle Scholar
  19. 19.
    H. Hieda, K. Tanaka, N. Gemma: J. Vac. Sci. Technol. B 14, 1234 (1996)CrossRefGoogle Scholar
  20. 20.
    H. Hieda, K. Tanaka, K. Naito, N. Gemma: Thin Solid Films 331, 152 (1998)CrossRefADSGoogle Scholar
  21. 21.
    K. Asakawa, T. Hiraoka: Annual APS march 2000 Meeting, I33-2Google Scholar
  22. 22.
    T. Maeda T. Kai, A. Kikitsu, T. Nagase, J. Akiyama: Appl. Phys. Lett. 80, 2147 (2002)CrossRefADSGoogle Scholar
  23. 23.
    K. Naito, M. Sakurai, S. Egusa: J. Phys. Chem. A 101, 2350 (1997)CrossRefGoogle Scholar
  24. 24.
    S. Egusa, N. Gemma, A. Miura, K. Mizushima, M. Azuma: J. Appl. Phys. 71, 2042 (1992)CrossRefADSGoogle Scholar
  25. 25.
    M. Deussen, M. Scheidler, H. Bassler: Synth. Met. 73, 123 (1995)CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2005

Authors and Affiliations

  • K. Naito
    • 1
  • H. Hieda
    • 1
  • T. Ishino
    • 1
  • K. Tanaka
    • 1
  • M. Sakurai
    • 1
  • Y. Kamata
    • 1
  • S. Morita
    • 1
  • A. Kikitsu
    • 1
  • K. Asakawa
    • 2
  1. 1.Storage Materials and Devices Laboratory Corporate Research and Development CenterToshiba CorporationKawasakiJapan
  2. 2.Advanced Materials and Devices Laboratory Corporate Research and Development CenterToshiba CorporationKawasakiJapan

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