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Historical Review of Excimer Laser Development

  • D. Basting
  • N. Djeu
  • K. Jain

Keywords

Excimer Laser IEEE Electron Device Projection Lithography Laser Chamber Femtosecond Time Scale 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    J.W. Ritter: Annalen der Physik 7, 527 (1801)Google Scholar
  2. 2.
    N.G. Basov, V.A. Danilychev, Y.M. Popov, D.D. Khodkevich: Zhourn. Eksperim. Fisika i Tekhnika Pis. Red. 12, 473 (1970)Google Scholar
  3. 3.
    M.F. Golde, B.A. Trush: Chem. Phys. Lett. 29, 486 (1974)Google Scholar
  4. 4.
    J.E. Velazco, D.W. Setser: J. Chem. 62, 1990 (1975)Google Scholar
  5. 5.
    J.J. Ewing, C.A. Brau: Phys. Rev. Lett. A 12, 129 (1975)Google Scholar
  6. 6.
    S.K. Searles, G.A. Hart: Appl. Phys. Lett. 27, 243 (1975)Google Scholar
  7. 7.
    E.R. Ault, R.S. Bradford, M.L. Bhaumik: Appl. Phys. Lett. 27, 413 (1975)Google Scholar
  8. 8.
    J.J. Ewing, C.A. Brau: Appl. Phys. Lett. 27, 350 (1975)Google Scholar
  9. 9.
    C.A. Brau, J.J. Ewing: Appl. Phys. Lett. 27, 435 (1975)Google Scholar
  10. 10.
    J.A. Mangano, J.H. Jacob: Appl. Phys. Lett 27, 495 (1975)Google Scholar
  11. 11.
    G.C. Tisone, J.M.H. A. K. Hays: Opt. Commun. 15, 188 (1975)Google Scholar
  12. 12.
    R. Burnham, N. W. Harris and N. Djeu: Appl. Phys. Lett. 28, 86 (1976)Google Scholar
  13. 13.
    R. Burnham, F. X. Powell and N. Djeu: Appl. Phys. Lett. 29, 30 (1976)Google Scholar
  14. 14.
    R. Burnham and N. Djeu: Appl. Phys. Lett. 29, 707 (1976)Google Scholar
  15. 15.
    F.P. Schäfer, W. Schmidt, K. Marth: Phys. Letters 24A, 280 (1967)Google Scholar
  16. 16.
    F.P. Schäfer, W. Schmidt, J. Volze: Appl. Phys. Letters 9, 306 (1966)Google Scholar
  17. 17.
    F.P. Schäfer, W. Schmidt, J. Volze, K. Marth: Ber. Bunsenges. phys. Chemie 72, 328 (1968)Google Scholar
  18. 18.
    F.P. Schäafer: Principles of dye laser operation, Vol. 1, 3rd edn. (Springer Verlag, Berlin, Heidelberg, 1990)Google Scholar
  19. 19.
    P.P. Sorokin, J.R. Lankard: IBM J. Res. Develop. 10, 162 (1966)Google Scholar
  20. 20.
    P.P. Sorokin, J.R. Lankard: IBM J. Res. Develop. 11, 148 (1967)Google Scholar
  21. 21.
    P.P. Sorokin, J.R. Lankard: Phys. Rev. 186, 342 (1969)Google Scholar
  22. 22.
    D. Basting, F.P. Schäfer, B. Steyer: Appl. Phys. 3, 81 (1974)Google Scholar
  23. 23.
    F.P. Schäfer, B. Steyer: Appl. Phys. 7, 113 (1975)Google Scholar
  24. 24.
    F.P.S. D. Basting D. Ouw: Opt. Commun. 18, 260 (1976)Google Scholar
  25. 25.
    L.P. dye laser: (1981), “FL 2000 brochure”Google Scholar
  26. 26.
    Lambda Physik HIGHLIGHTS 5, 4 (1987)Google Scholar
  27. 27.
    Lambda Physik HIGHLIGHTS 2, 2 (1986)Google Scholar
  28. 28.
    Lambda Physik HIGHLIGHTS 5, 1 (1987)Google Scholar
  29. 29.
    P.B. Corkum, R.S. Taylor: IEEE J. Quant. Electron. 18, 1962 (1982)Google Scholar
  30. 30.
    H. Egger, T.S. Luk, K. Boyer, D.F. Muller, H. Pummer, T. Srinivasan, C.K. Rhodes: Appl. Phys. Lett. 41, 1032 (1982)Google Scholar
  31. 31.
    S. Szatmári, F.P. Schäfer: Opt. Commun. 48, 279 (1983)Google Scholar
  32. 32.
    S. Szatmári, G. Kühnle, J. Jasny, F.P. Schäer: Appl. Phys. B 49, 239 (1989)Google Scholar
  33. 33.
    F.P. Schäfer: Phys. Bl. 42, 283 (1986)Google Scholar
  34. 34.
    M. Trentelman, P.J.M. Peters, Q.C. Mei, W.J. Wittemann: J. Opt. Soc. Am. B 12, 2494 (1995)Google Scholar
  35. 35.
    M. Steyer, K.A. Stankov, H. Mizoguchi, B. Ouyang, F.P. Schäfer: Appl. Phys. B 49, 331 (1989)Google Scholar
  36. 36.
    V.Y. Baranov, V.M. Borisov, D.N. Molchanov, V.P. Novikov, O.B. Khristoforov: Sov. J. Quantum Electron. 17, 978 (1987)Google Scholar
  37. 37.
    M.J. Shaw, F. O’Neill, C.B. Edwards, D.J. Nicolas, D. Craddock: Appl. Phys. B 28, 127 (1982)Google Scholar
  38. 38.
    K. Jain et al.: IEEE Electron Device Lett. EDL-3, 53 (1982)Google Scholar
  39. 39.
    K. Jain et al.: Proc. SPIE 334, 259 (1982)Google Scholar
  40. 40.
    K. Jain, C.G. Wilson: “High resolution optical lithography method and apparatus having excimer laser light source”, U.S. Patent 4,458,994, July 10, 1984Google Scholar
  41. 41.
    K. Jain: Appl. Optics 23, 648 (1984)Google Scholar
  42. 42.
    K. Jain, R. Kerth: Proc. Microcir. Engg., Cambridge p. 181 (1983)Google Scholar
  43. 43.
    K. Jain, R. Kerth: IEEE Electron Device Lett EDL-7, 299 (1986)Google Scholar
  44. 44.
    K. Jain: SPIE Press (1990)Google Scholar
  45. 45.
    W.J. Leigh, R. Srinivasan: Acct. Chem. Res. 20, 107 (1987)Google Scholar
  46. 46.
    R. Srinivasan, V. Mayne-Banton: Appl. Phys. Lett. 41, 576 (1982)Google Scholar
  47. 47.
    R. Srinivasan: Laser processing and diagnostics (Springer Verlag, 1984)Google Scholar
  48. 48.
    R. Srinivasan, B. Braren, D. Seeger, R.W. Dreyfus: Macromol. 19, 916 (1986)Google Scholar
  49. 49.
    R. Srinivasan: Science 234, 559 (1986)PubMedGoogle Scholar
  50. 50.
    S.E. Blum, K. Brown, R. Srinivasan: U.S. Patent 4,451,503Google Scholar
  51. 51.
    R. Srinivasan, W.J. Leigh: J. Amer. Chem. Soc. 104, 6784 (1982)Google Scholar
  52. 52.
    F. Bachmann: Chem. Tronics 4, 149 (1989)Google Scholar
  53. 53.
    J.R. Lankard, G. Wolbold: Appl. Phys. A 54, 355 (1992)Google Scholar
  54. 54.
    R. Srinivasan, J.J. Wynne, S.E. Blum: Laser Focus p. 62 (1983)Google Scholar
  55. 55.
    R.S. S. E. Blum, J.J. Wynne: U.S. Patent 4,784,135Google Scholar
  56. 56.
    J.E. Andrew, P.E. Dyer, D. Forster, P. Keys: Appl. Phys. Lett. 43, 717 (1983)Google Scholar
  57. 57.
    S.L. Trokel, R. Srinivasan, B. Braren: Am. J. Ophthalmology 96, 710 (1983)Google Scholar
  58. 58.
    P.E. Dyer: Appl. Phys. A 77(2) (2003)Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2005

Authors and Affiliations

  • D. Basting
  • N. Djeu
  • K. Jain

There are no affiliations available

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