High-k Gate Dielectric Deposition Technologies

  • J.P. Chang
Part of the Springer Series in Advanced Microelectronics book series (MICROELECTR., volume 16)


Atomic Layer Deposition Equivalent Oxide Thickness Atomic Layer Deposition Process Interfacial Layer Thickness Atomic Layer Deposition Cycle 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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© Springer-Verlag Berlin Heidelberg 2005

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  • J.P. Chang

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