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High Dielectric Constant Materials pp 379–413Cite as

High-k Gate Dielectric Deposition Technologies

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  1. J.P. Chang
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    H.R. Huff

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    D.C. Gilmer

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Chang, J. (2005). High-k Gate Dielectric Deposition Technologies. In: Huff, H., Gilmer, D. (eds) High Dielectric Constant Materials. Springer Series in Advanced Microelectronics, vol 16. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-26462-0_13

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