Part of the NanoScience and Technology book series (NANO)


Chemical Mechanical Polishing Gate Oxide Electron Beam Lithography Dynamic Random Access Memory SiGe Layer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

10.10 Further Reading

  1. 1.
    S.M. Sze, Semiconductor Devices: Physics and Technology 2nd Edition, John Wiley and Sons, New York (2002)Google Scholar
  2. 2.
    C.Y. Chang and S.M. Sze, ULSI Technology, McGraw Hill (1996)Google Scholar
  3. 3.
    D.L. Harame et al., IEEE Trans. Elec. Dev. 24, 324 (1995)Google Scholar
  4. 4.
    International Technology Roadmap for Semiconductors 2003 Edition, ( Scholar
  5. 5.
    D.J. Paul, Semiconductor Science and Technology 19, R59 (2004)CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2005

Personalised recommendations