Part of the NanoScience and Technology book series (NANO)
KeywordsChemical Mechanical Polishing Gate Oxide Electron Beam Lithography Dynamic Random Access Memory SiGe Layer
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10.10 Further Reading
- 1.S.M. Sze, Semiconductor Devices: Physics and Technology 2nd Edition, John Wiley and Sons, New York (2002)Google Scholar
- 2.C.Y. Chang and S.M. Sze, ULSI Technology, McGraw Hill (1996)Google Scholar
- 3.D.L. Harame et al., IEEE Trans. Elec. Dev. 24, 324 (1995)Google Scholar
- 4.International Technology Roadmap for Semiconductors 2003 Edition, (http://public.itrs.org)Google Scholar
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