Part of the NanoScience and Technology book series (NANO)
KeywordsComplementary Metal Oxide Semiconductor Inversion Layer Very Large Scale Integration Silicon Chip Drain Induce Barrier Lowering
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1.4 Further Reading
- 1.C.Y. Chang and S.M. Sze, ULSI Technology, McGraw-Hill, New York (1996)Google Scholar
- 2.S. Luryi, I. Xu, A. Zaslovsky, Future Trends in Microelectronics-The Road Ahead, J. Wiley, New York (1999)Google Scholar
- 3.R. Campano, Technology Roadmap for European Nanoelectronics, EC (2000)Google Scholar
- 5.International Technology Roadmap for Semiconductors, 2003 EditionGoogle Scholar
- 6.C. Teichert, Physics Reports, Vol.365 Number 5–6 (2002)Google Scholar
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