Advertisement

Chemical sputtering

  • Joachim Roth
Chapter
Part of the Topics in Applied Physics book series (TAP, volume 52)

Keywords

Pyrolytic Graphite Target Atom Methane Formation Physical Sputtering Surface Binding Energy 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 3.1
    W.R.Grove: Philos. Trans. R. Soc. London 11, 87 (1852)Google Scholar
  2. 3.2
    V. Kohlschütter: Jahrb. Radioakt. 9, 355 (1912)Google Scholar
  3. 3.3
    A.Güntherschulze: Z. Phys. 36, 563 (1926)Google Scholar
  4. 3.4
    R.Behrisch (ed.): Sputtering by Particle Bombardment I, Topics Appl. Phys., Vol. 47 (Springer, Berlin, Heidelberg, New York 1981)Google Scholar
  5. 3.5
    S. M. Myers: Radiat. Eff. 49, 95 (1980)Google Scholar
  6. 3.6
    E. Giani, D. K. Murti, R. Kelly: Proc. Symp. on Thin Film Phenomena — Interfaces and Interactions, The Electrochem. Soc. Proc. Vol. 78-2, 443 (1978)Google Scholar
  7. 3.7
    J.P.Biersack: Radiat. Eff. 19, 249 (1973)Google Scholar
  8. 3.8
    F. Schulz, K. Wittmaack: Radiat. Eff. 29, 31 (1976)Google Scholar
  9. 3.9
    Z. L. Liau, J. W. Mayer: J. Vac. Sci. Technol. 15, 1629 (1978)Google Scholar
  10. 3.10
    P. Sigmund, A. Gras-Marti: Nucl. Instrum. Methods 168, 389 (1980)Google Scholar
  11. 3.11
    A. Gras-Marti, P. Sigmund: In Proc. Symp. on Sputtering (SOS), eds. by P. Varga, G. Betz, F. P. Viehböck (Techn. Univ. Wien, 1980) p. 512Google Scholar
  12. 3.12
    U.Littmark, W.O.Hofer: Nucl. Instrum. Methods 168, 329 (1980)Google Scholar
  13. 3.13
    O. Almén, G. Bruce: Nucl. Instrum. Methods 11, 279 (1961)Google Scholar
  14. 3.14
    P. Sigmund: In Inelastic Ion-Surface Collisions, eds. by N. H. Tolk, J. C. Tully, W. Heiland, C. W. White (Academic Press, New York 1977) p. 121Google Scholar
  15. 3.15
    ERDA Task group (1978)Google Scholar
  16. 3.16
    D. M. Gruen, S. Veprek,R. B. Wright: In Plasma Chemistry I, Topics Current Chem. (Springer, Berlin, Heidelberg, New York 1980)Google Scholar
  17. 3.17
    Y.-Y.Tu, T.J.Chuang, H.F.Winters: In Proc. Symp. on Sputtering (SOS), eds. by P. Varga, G. Betz, F.P. Viehböick (Techn. Univ. Wien, 1980) p. 337Google Scholar
  18. 3.18
    J. Bohdansky, J. Roth, H. L. Bay: J. Appl. Phys. 51, 2861 (1980)Google Scholar
  19. 3.19
    G.K.Wolf: Topics in Current Chem. 85, 1 (1979)Google Scholar
  20. 3.20
    Proc. Ist Intern. Conf. Ion Beam Modification of Materials, eds. by J. Gyulai, P. Lohner, E. Pasztor. Radiat. Eff. 47-49 (1980)Google Scholar
  21. 3.21
    Proc. 2nd Intern. Conf. Ion Beam Modification of Materials, eds. by R. E. Benenson, E. N. Kaufmann, G.L. Miller, W.W. Scholz. Nucl. Instrum. Methods 182/183 (1981)Google Scholar
  22. 3.22
    G. A. Somorjai: Surf. Sci. 89, 496 (1979)Google Scholar
  23. 3.23
    Proc. of 4th Intern. Symp. on Plasma Chemistry, eds. by S. Veprek, J. Hertz, Univ. Zürich, Switzerland (Aug. 1979)Google Scholar
  24. 3.24
    R.K.Gould: J. Chem. Phys. 63, 1825 (1975)Google Scholar
  25. 3.25
    M. Balooch, D. R.Olander: J. Chem. Phys. 63, 4772 (1975)Google Scholar
  26. 3.26
    G. M. McCracken, J. H. C. Maple, H. H. H. Watson: Rev. Sci. Instr. 37, 860 (1966)Google Scholar
  27. 3.27
    R.H.Jones, D.R.Olander, W.J.Siekhaus, J.A.Schwarz: J. Vac. Sci. Technol. 9, 1429 (1972)Google Scholar
  28. 3.28
    J. W.Coburn, E. Kay: In Proc. 7th Intern. Vacuum Congr. and 3rd Intern. Conf. on Solid Surf., eds. by R. Dobrozemsky, F. Rüdenauer, F.P. Viehblick, A. Breth, Vienna (1977) p. 1257Google Scholar
  29. 3.29
    H.Oechsner, W.Gerhard: Phys. Lett. 40A, 211 (1972)Google Scholar
  30. 3.30
    J. Bates, D. M. Gruen, R. Varma: Rev. Sci. Instrum. 47, 1506 (1976)Google Scholar
  31. 3.31
    D. M. Gruen, S. L. Gaudioso, R. L. McBeth, J. L. Lerner: J. Chem. Phys. 60, 89 (1974)Google Scholar
  32. 3.32
    J. S. Shirk, A. M. Bass: J. Chem. Phys. 52, 1894 (1970)Google Scholar
  33. 3.33
    D. H. Carstens, D. M. Gruen, J. F. Kotzlowski: High Temp. Sci. 4, 436 (1972)Google Scholar
  34. 3.34
    D. M.Gruen, P. A. Finn, D. L.Page: Nucl. Technol. 29, 309 (1976)Google Scholar
  35. 3.35
    P.A.Finn, D.M.Gruen, D.L.Page: In Radiation Effects on Solid Surfaces, Adv. in Chem. Series 158, 30 (1976)Google Scholar
  36. 3.36
    D. W. Green, W. Korfmacher, D. M. Gruen: J. Chem. Phys. 58, 404 (1973)Google Scholar
  37. 3.37
    T. E. Parker, R. Kelly: J. Phys. Chem. Solids 36, 377 (1975)Google Scholar
  38. 3.38
    J. Roth, W. Eckstein, J. Bohdansky: Radiat. Eff. 48, 231 (1980)Google Scholar
  39. 3.39
    H. v. Seefeld, R. Behrisch, B. M. U. Scherzer, Ph. Staib, H. Schmidl: Proc. 7th Intern. Conf. Atomic Collisions in Solids (Moscow State University Publishing House 1981) p. 327Google Scholar
  40. 3.40
    R. B. Wright, R. Varma, D. M. Gruen: J. Nucl. Mater. 63, 415 (1976)Google Scholar
  41. 3.41
    D. M. Gruen, B. Siskind, R. B. Wright: J. Chem. Phys. 65, 363 (1976)Google Scholar
  42. 3.42
    J. W. Coburn, H. F. Winters, T. J. Chuang: J. Appl. Phys. 48, 3532 (1977)Google Scholar
  43. 3.43
    S. K. Erents: Inst. Phys. Conf. Ser. 28, 318 (1976)Google Scholar
  44. 3.44
    A. R. Krauss, D. M. Gruen: Appl. Phys. 14, 89 (1977)Google Scholar
  45. 3.45
    H. Oechsner, L. Reichert: Phys. Lett. 23, 90 (1966)Google Scholar
  46. 3.46
    H. Oechsner: Z. Phys. 238, 433 (1970)Google Scholar
  47. 3.47a
    A. Benninghoven, C. A. Evans, Jr., R. A. Powell, R. Shimizu, H. A. Storms (eds.): SIMS III, Springer Ser. Chem. Phys., Vol. 9 (Springer, Berlin, Heidelberg, New York 1979)Google Scholar
  48. 3.47b
    A. Benninghoven, J. Giber, J. László, M. Riedel, H. W. Werner (eds.): SIMS III, Springer Ser. Chem. Phys., Vol. 19 (Springer, Berlin, Heidelberg, New York 1982)Google Scholar
  49. 3.48
    G. P. Können, J. Grosser, A. Haring, A. E. de Vries, J. Kistemaker: Radiat. Eff. 21, 171 (1974)Google Scholar
  50. 3.49
    M. Szymonski, H. Overeijnder, A. E. de Vries: Radiat. Eff. 36, 189 (1978)Google Scholar
  51. 3.50
    R. A. Haring, A. Haring, F. W. Saris, A. E. de Vries: Appl. Phys. Lett. 41, 174 (1982)Google Scholar
  52. 3.51
    D. Hammer, E. Benes, P. Blum, W. Husinsky: Rev. Sci. Instrum. 47, 1178 (1976)Google Scholar
  53. 3.52
    A. Elbern, E. Hintz, B. Schweer: J. Nucl. Mater. 76/77, 143 (1978)Google Scholar
  54. 3.53
    E.Dullni, E.Hintz: Verhandl. DPG (VI) 16, 908 (1981)Google Scholar
  55. 3.54
    R.S.Nelson: In Applications of Ion Beams to Metals, eds. by S.T.Picraux, E.P.EerNisse, F. L. Vook (Plenum Press, New York 1974) p. 221Google Scholar
  56. 3.55
    J.M.Poate: Radiat. Eff. 49, 81 (1980)Google Scholar
  57. 3.56
    J.M.Poate: J. Vac. Sci. Technol. 15, 1636 (1978)Google Scholar
  58. 3.57
    E. N. Kaufmann, L. Buene: Nucl. Instrum. Methods 182/183, 327 (1981)Google Scholar
  59. 3.58
    J. F. Ziegler, C. P. Wu, P. Williams, C. W. White, B. Terreault, B. M. U. Scherzer, R. L. Schulte, E. J. Schneid, C. W. Magee, E.Ligeon,J. L. Écuyer, W. A. Lanford, F. J. Kuehne, E. A. Kamykowski, W.O. Hofer, A. Guivarch, C. H. Filleux, V. R. Deline, C. A. Evans, Jr., B. L. Cohen, G. J. Clark, W. K. Chu, C. Brassard, R. S. Blewer, R. Behrisch, B. R. Appleton, D. D. Allred: Nucl. Instrum. Methods 149, 19 (1978)Google Scholar
  60. 3.59
    J. Brottiger: J. Nucl. Mater. 78, 161 (1978)Google Scholar
  61. 3.60
    Proc. 3rd Intern. Conf. on Plasma Surface Interaction in Controlled Fusion Devices. J. Nucl. Mater. 76/77 (1978) Proc. 4th Intern. Conf. on Plasma Surface Interaction in Controlled Fusion Devices. J. Nucl. Mater. 94/95 (1980) Proc. 5th Intern. Conf. on Plasma Surface Interaction in Controlled Fusion Devices. J. Nucl. Mater. 111/112 (1982)Google Scholar
  62. 3.61
    E. S. Hotston, G. M. McCracken: J. Nucl. Mater. 68, 277 (1977)Google Scholar
  63. 3.62
    W. M. Müller, J. P. Blackledge, G. G. Libowitz (eds.): Metal Hydrides (Academic Press, New York 1968)Google Scholar
  64. 3.63
    Gase und Kohlenstoff in Metallen, eds. by E. Fromm, E. Gebhardt (Springer, Berlin, Heidelberg, New York 1976)Google Scholar
  65. 3.64
    M. K. Sinha, J. Roth, J. Bohdansky: Proc. 9th Symp. on Fusion Technology (GarmischPartenkirchen, FR Germany 1976) p. 41Google Scholar
  66. 3.65
    J.Bohdansky, J.Roth, M.K.Sinha, W.Ottenberger: J. Nucl. Mater. 63, 115 (1976)Google Scholar
  67. 3.66
    I. Sheft, A. M. Reis Jr., D. M. Gruen, S. W. Paterson: J. Nucl. Mater. 59, 1 (1976)Google Scholar
  68. 3.67
    W. Möller, J. Brottiger: J. Nucl. Mater. 88, 95 (1980)Google Scholar
  69. 3.68
    O. C. Yonts, R. A. Strehlow: J. Appl. Phys. 32, 192 (1961)Google Scholar
  70. 3.69
    R. H. Stulen: Appl. Surf. Sci. 5, 212 (1980)Google Scholar
  71. 3.70
    A.Pontau, K. L. Wilson, F.Greulich, L. G.Haggmark: J. Nucl. Mater. 91, 343 (1980)Google Scholar
  72. 3.71
    G. M. McCracken, J. H. Maple: Brit. J. Appl. Phys. 18, 919 (1967)Google Scholar
  73. 3.72
    D. M. Gruen, R. Varma, R. B. Wright: J. Chem. Phys. 64, 5000 (1976)Google Scholar
  74. 3.73
    S. K. Erents, C. M. Braganza, G. M. McCracken: J. Nucl. Mater. 63, 399 (1976)Google Scholar
  75. 3.74
    R. A. Langley, R. S. Blewer, J. Roth: J. Nucl. Mater. 76/77, 313 (1978)Google Scholar
  76. 3.75
    B. M.U. Scherzer, R. A. Langley, W. Möller, J. Roth, R. Schulz: Nucl. Instrum. Methods 194, 497 (1982)Google Scholar
  77. 3.76
    G. Staudenmaier, J. Roth, R. Behrisch, J. Bohdansky, W. Eckstein, P. Staib, S. Matteson, S. K. Erents: J. Nucl. Mater. 84, 149 (1979)Google Scholar
  78. 3.77
    W. R. Wampler, D. K. Brice, C. W. Magee: J. Nucl. Mater. 102, 304 (1981)Google Scholar
  79. 3.78
    B. M. U. Scherzer, R. Behrisch, W. Eckstein, U. Littmark, J. Roth, M. K. Sinha: J. Nucl. Mater. 63, 100 (1976)Google Scholar
  80. 3.79
    J. Roth, B. M. U. Scherzer, R. S. Blewer, D. K. Brice, S. T.Picraux, W. R. W ampler: J. Nucl. Mater. 94/95,601 (1980)Google Scholar
  81. 3.80
    B. L. Doyle, W. R. Wampler, D. K. Brice: J. Nucl. Mater. 103/104, 513 (1981)Google Scholar
  82. 3.81
    P. L.Mattern, G. J. Thomas, W. Bauer: J. Vac. Sci. Technol. 13, 430 (1976)Google Scholar
  83. 3.82
    B. Siskind, D. M. Gruen, R. Varma: J. Vac. Sci. Technol. 14, 537 (1977)Google Scholar
  84. 3.83
    M. Guermazi, P. Thevenard, P. Faisant, M. G. Blanchin, C. H. S. Dupuy: Radiat. Eff. 37, 99 (1978)Google Scholar
  85. 3.84
    G. Dearnaley, J. H. Freeman, R. S. Nehon, J. Stephen: Ion Implantation (North-Holland, Amsterdam 1973)Google Scholar
  86. 3.85
    G. Dearnaley: In Nucl. Physics Methods in Material Research, eds. by K. Bethge, H. Baumann, H. Jex, F. Rauch (Vieweg, Braunschweig 1980) p. 56Google Scholar
  87. 3.86
    P. V.Parlow, E. I. Zonin, D. I. Tetelbaum, V. P. Lesnikov, G. M. Ryzhkov, A. V.Parlow: Phys. Status Solidi A: 19, 373 (1973)Google Scholar
  88. 3.87
    J. H. Wilson, K. H. Goh, K. G. Stephens: Thin Solid Films 33, 205 (1976)Google Scholar
  89. 3.88
    D. K. Murti, E. Giani, M. Arora, R. Kelly: To be publishedGoogle Scholar
  90. 3.89
    M.Watanabe, A.Tooi: Jpn. J. Appl. Phys. 5, 737 (1966)Google Scholar
  91. 3.90
    S. S. Gill, I. H. Wilson: In Proc. Ist Conf. on Ion Beam Modification of Materials, eds. by J. Gyulai, T. Lohner, E. Pasztor (Budapest, Hungary 1978) p. 1231Google Scholar
  92. 3.91
    J. H. Freeman, G. A. Gard, D. J. Mazey, J. H. Stephen, F. B. Whiting:In Proc.Conf.Ion Implantation (Reading, England 1970) p. 73Google Scholar
  93. 3.92
    J. A. Borders, W. Beezhold: In Ion Implantation in Semiconductors, eds. by I. Ruge, J. Graul (Springer, Berlin, Heidelberg, New York 1971) p. 241Google Scholar
  94. 3.93
    I.P. Akimchenko, K. V. Kisseleva, V. V. Krasnopevtsev, Yu. V. Milyutin, A. G. Touryanski, V.S.Vavilov: Radiat. Eff. 33, 75 (1977)Google Scholar
  95. 3.94
    I.P. Akimchenko,K. V. Kisseleva, V. V. Krasnopevtsev, A. G. Touryanski,V. S. Vaivlov: Radiat. Eff. 48, 7 (1980)Google Scholar
  96. 3.95
    T.J.Chuang: J. Chem. Phys. 72, 6303 (1980)Google Scholar
  97. 3.96
    O. Almén, G. Bruce: Nucl. Instrum. Methods 11, 257 (1961)Google Scholar
  98. 3.97
    H. H. Andersen, H. Bay: Radiat. Eff. 13, 67 (1972)Google Scholar
  99. 3.98
    H. H. Andersen, H. Bay: Radiat. Eff. 19, 139 (1973)Google Scholar
  100. 3.99
    H. L. Bay, J. Bohdansky, E. Hechtl: Radiat. Eff. 41, 77 (1979)Google Scholar
  101. 3.100
    E. Hecht], J. Bohdansky, J. Roth: In Proc. Symp. on Sputtering, eds. by P. Varga, G. Betz, F.P. Viehböck (Techn. Univ. Wien, 1980) p. 834Google Scholar
  102. 3.101
    E.Hechtl, J.Bohdansky, J. Roth: J. Nucl. Mater. 103/104, 333 (1981)Google Scholar
  103. 3.102
    R. Behrisch: Erg. Exakt. Naturw. 35, 295 (1964)Google Scholar
  104. 3.103
    O. C. Yonts, D. E. Harrison: J. Appl. Phys. 31, 447 (1960)Google Scholar
  105. 3.104
    W. Wach, K. Wittmaack: Nucl. Instrum. Methods 149, 259 (1978)Google Scholar
  106. 3.105
    W.O. Hofer, H. Liebl: In Ion Beam Surface Layer Analysis, eds. by O. Meyer, G. Linker, F. Käppeler (Plenum Press, New York 1976) p. 659Google Scholar
  107. 3.106
    W.O. Hofer, H. L. Bay, P. J. Martin: J. Nucl. Mater. 76/77, 156 (1978)Google Scholar
  108. 3.107
    J. Hrbek: Thin Solid Films 42, 185 (1977)Google Scholar
  109. 3.108
    R. Behrisch, J. Roth, J. Bohdansky, A.P. Martinelli, B. Schweer, D. Rusbüldt, E. Hintz: J. Nucl. Mater. 94/95, 645 (1980)Google Scholar
  110. 3.109
    J. Roth: Unpublished dataGoogle Scholar
  111. 3.110
    R. Kelly, N. Q. Lam: Radiat. Eff. 19, 39 (1973)Google Scholar
  112. 3.111
    J. Roth, J. Bohdansky, W.Ottenberger: Max-Planck-Institut für Plasmaphysik, Garching, FRG, Rpt. IPP 9/26 (1979)Google Scholar
  113. 3.112
    T. Abe, T. Yamashina: Thin Solid Films 30, 19 (1975)Google Scholar
  114. 3.113
    W. D. Westwood: Progr. Surf. Sci. 7, 71 (1976)Google Scholar
  115. 3.114
    J.Heller: Thin Solid Films 17, 163 (1973)Google Scholar
  116. 3.115
    R. F. K. Herzog, W.P.Poschenrieder, F. G. Satkiewicz: Radiat. Eff. 18, 199 (1973)Google Scholar
  117. 3.116
    G.Staudenmaier: Radiat. Eff. 13, 87 (1972)Google Scholar
  118. 3.117
    F. Shinoki, A.Itoh: Jpn. J. Appl. Phys. Suppl. 2, Pt. 1, 505 (1974)Google Scholar
  119. 3.118
    R. Behrisch (ed.): Sputtering by Particle Bombardment III, Topics Appl. Phys. (Springer, Berlin, Heidelberg, New York) to be publishedGoogle Scholar
  120. 3.119
    K.Wittmaack: Surf. Sci. 89, 668 (1979)Google Scholar
  121. 3.120
    A. E. Morgan, H. W. Werner: Appl. Phys. 11, 193 (1976)Google Scholar
  122. 3.121
    A.Benninghoven, C.Plog, N.Treitz: Int. J. Mass Spectrom. Ion Phys. 13, 415 (1974)Google Scholar
  123. 3.122
    C. Plog, L. Wiedmann, A. Benninghoven: Surf. Sci. 67, 565 (1977)Google Scholar
  124. 3.123
    A. E. Morgan, H. W. Werner: J. Chem. Phys. 68, 3900 (1978)Google Scholar
  125. 3.124
    A. R. Krauss, D. M. Gruen: J. Nucl. Mater. 63, 380 (1976)Google Scholar
  126. 3.125
    D. H. W. Carstens, J. F. Kozlowski, D. M. Gruen: High Temp. Sci. 4, 301 (1972)Google Scholar
  127. 3.126a
    D. M.Gruen: In The Chemistry of Fusion Technology, ed. by D. M. Gruen (Plenum Press, New York 1972) p. 215Google Scholar
  128. 3.126b
    D. M. Gruen: J. Nucl. Mater. 53, 220 (1974)Google Scholar
  129. 3.127
    J. Roth, J. Bohdansky, W. Poschenrieder, M. K. Sinha: J. Nucl. Mater. 63, 222 (1976)Google Scholar
  130. 3.128
    B. Feinberg, R. S.Post: J. Vac. Sci. Technol. 13, 443 (1976)Google Scholar
  131. 3.129
    N.P. Busharov, E. A. Gorbatov, V. M. Gusev, M. I. Guseva, Yu. V. Martynenko: Sov. J. Plasma Phys. 2, 321 (1976)Google Scholar
  132. 3.130
    C. M. Braganza, S. K. Erents, G. M. McCracken: J. Nucl. Mater. 75, 220 (1978)Google Scholar
  133. 3.131
    R. Yamada, K. Nakamura, K. Sone, M. Saidoh: J. Nucl. Mater. 95,278 (1980)Google Scholar
  134. 3.132
    D. E. Rosner, H. D. Allendorf: Proc. Int. Conf. Heter. Kinetics at Elevated Temp. (Univ. Pennsylvania 1969) p. 231 and references thereinGoogle Scholar
  135. 3.133
    M. Coulon, L. Bonnetain: J. Chim. Phys. 71, 711, 717, 725 (1974)Google Scholar
  136. 3.134
    S. Veprek, M. R. Haque, H. R. Oswald: J. Nucl. Mater. 63, 405 (1976)Google Scholar
  137. 3.135
    R. Brewer, H. Stuessi, S. Veprek, A.P. Webb: J. Nucl. Mater. 93/94, 634 (1980)Google Scholar
  138. 3.136
    B.J. Wood, H. Wise: J. Phys. Chem. 73,1348 (1969)Google Scholar
  139. 3.137
    L. Holland, S.M. Ojha: Vacuum 26, 53 (1976)Google Scholar
  140. 3.138
    D. R.Olander, R. H.Jones, J. A. Schwarz, W. J. Siekhaus: J. Chem. Phys. 57, 421 (1972)Google Scholar
  141. 3.139
    D. R.Olander, W. Siekhaus, R.Jones, J. A. Schwarz: J. Chem. Phys. 57, 408 (1972)Google Scholar
  142. 3.140
    R. Castaing, O. Hennequin: Adv. Mass Spectrom. 5, 419 (1971)Google Scholar
  143. 3.141
    R. S. Nelson: Philos. Mag. 11, 291 (1965)Google Scholar
  144. 3.142
    J. Bohdansky, J. Roth, A. P. Martinelli: Presented at the 4th Intern. Conf, on Solid Surfaces, Cannes (1980) to be publishedGoogle Scholar
  145. 3.143
    T. Abe, K.Obara, Y.Murakami: J. Nucl. Mater. 91, 233 (1980)Google Scholar
  146. 3.144
    J. Roth, J. Bohdansky, K. L. Wilson: J. Nucl. Mater. 111/112, 775 (1982)Google Scholar
  147. 3.145
    V. Philipps, K. Flaskamp, E.Vietzke: J. Nucl. Mater. 111/112, 781 (1982)Google Scholar
  148. 3.146
    C. Braganza, G. M. McCracken, S. K. Erents: Proc. Intern. Symp. Plasma Wall Interaction (Jülich 1976) p. 257Google Scholar
  149. 3.147
    M. Mohri, K. Watanabe, T. Yamashina: J. Nucl. Mater. 75, 7 (1978)Google Scholar
  150. 3.148
    M. Mohri, K. Watanabe, T. Yamashina, H. Doi, K. Hyakawa: J. Nucl. Mater. 85/86, 1185 (1979)Google Scholar
  151. 3.149
    N. P. Busharov, E. A. Gorbatov, V. M. Gusev, M. I. Guseva,Yu. V. Martynenko: J. Nucl. Mater. 63, 230 (1976)Google Scholar
  152. 3.150
    K. Sone, H.Ohtsuka, T. Abe, R. Yamada, K.Obara, O. Tsukakoshi, T. Narusawa, T. Satake, M. Mizuno, S. Komiya: Proc. Intern. Symp. Plasma Wall Interaction (Jülich 1976) p. 323Google Scholar
  153. 3.151
    R. Yamada, K. Nakamura, M. Saidoh: J. Nucl. Mater. 98, 167 (1981)Google Scholar
  154. 3.152
    R. Yamada, K. Nakamura, M. Saidoh: J. Nucl. Mater. 111/112, 744 (1982)Google Scholar
  155. 3.153
    A.E.Pontau, K.L.Wilson: J. Vac. Sci. Technol. 20,1322 (1982)Google Scholar
  156. 3.154
    R. R. Rye: Surf. Sci. 69, 653 (1977)Google Scholar
  157. 3.155
    J. Roth, J.Bohdansky: IEA Workshop on Graphite, Rigi-Kaltbad, Swizerland (Oct. 1982) to be publishedGoogle Scholar
  158. 3.156
    J. W. Coburn, H. F. Winters: J. Vac. Sci. Technol. 16, 391 (1979)Google Scholar
  159. 3.157
    A. J. Machiels, D. R.Olander: Surf. Sci. 65, 325 (1977)Google Scholar
  160. 3.158
    A. J.Machiels, D. R.Olander: High Temp. Sci. 9, 3 (1977)Google Scholar
  161. 3.159
    P. C. Nordine: J. Electrochem. Soc. 125, 498 (1978)Google Scholar
  162. 3.160
    M. W. Thompson: Philos. Mag. 18, 377 (1968)Google Scholar
  163. 3.161
    S. Kato, T. Satake, M. Mohri, T. Yamashina: J. Nucl. Mater. 103/104, 351 (1981)Google Scholar
  164. 3.162
    M. Szymonski,A. E. de Vries: Proc. Symp. on Sputtering, ed. by P. Varga,G. Betz, F.P. Viehblick (Techn. Univ. Wien, 1980) p. 320Google Scholar
  165. 3.163
    W. Poschenrieder, G. Staudenmaier, Ph. Staib: J. Nucl. Mater. 93/94, 322 (1980)Google Scholar
  166. 3.164
    H. F. Dylla: J. Nucl. Mater. 93/94, 61 (1980)Google Scholar
  167. 3.165
    A.G.Mathewson: Proc. Intern. Symp. Plasma Wall Interaction, Jülich (1976) p. 517Google Scholar
  168. 3.166
    W.Poschenrieder: Max-Planck-Institut für Plasmaphysik, Garching, FRG (private communication)Google Scholar
  169. 3.167
    L. M. Ephrath: J. Electrochem. Soc. 126, 1419 (1979)Google Scholar
  170. 3.168
    R. A. H. Heinecke: Solid State Electron. 18, 1146 (1975)Google Scholar
  171. 3.169
    T. Yamashina, M. Mori, K. Watanabe, H. Doi, K. Hayakawa: J. Nucl. Mater. 76/77 (1978)Google Scholar
  172. 3.170
    A. A. Bergh: Bell Syst. Tech. J. 154, 261 (1965)Google Scholar
  173. 3.171
    E. Blauth, E. Mayer, F. Schwirzke: Proc. 5th Intern. Conf. Ionization Phenomena in Gases, Munich (1961) p. 545Google Scholar
  174. 3.172
    E. W. Blauth, E. H. Meyer: Z. Angew. Phys. 19, 549 (1965)Google Scholar
  175. 3.173
    G. M. McCracken, J. W. Patridge: J. Nucl. Mater. 63, 773 (1976)Google Scholar
  176. 3.174
    Y.Ishibe, H.Oyama: J. Nucl. Mater. 85/86,1191 (1979)Google Scholar
  177. 3.175
    E. Taglauer, W. Heiland: Appl. Phys. Lett. 23, 950 (1978)Google Scholar
  178. 3.176
    S. Veprek, A.P. Webb, H. R.Oswald, H. Stuessi: J. Nucl. Mater. 68, 32 (1977)Google Scholar
  179. 3.177
    E.Vietzke, K.Flaskamp, V.Philipps: J. Nucl. Mater. 111/112, 763 (1982)Google Scholar
  180. 3.178
    C. I. H. Ashby, R. R. Rye: J. Nucl. Mater. 92, 141 (1980)Google Scholar
  181. 3.179
    C.I. H. Ashby, R. R. Rye: J. Nucl. Mater. 103/104, 489 (1981)Google Scholar
  182. 3.180
    C. I. H. Ashby: 29th Symp. Am. Vac. Soc., J. Vac. Sci. Technol. (to be published)Google Scholar
  183. 3.181
    A. A. Haasz, P. C. Stangeby, O. Anciello: J. Nucl. Mater. 111/112, 757 (1982)Google Scholar
  184. 3.182
    J. W. Coburn, H. F. Winters: J. Appl. Phys. 50, 3189 (1979)Google Scholar
  185. 3.183
    H. F. Winters, J. W. Coburn: Appl. Phys. Lett. 34, 70 (1979)Google Scholar
  186. 3.184
    B. Carriere, B. Lang: Surf. Sci. 64, 209 (1977)Google Scholar
  187. 3.185
    J.L.Vossen: J. Appl. Phys. 47, 544 (1976)Google Scholar
  188. 3.186
    R. T. K. Baker, J. J.Chludzinski, Jr.: Carbon 19, 75 (1981)Google Scholar
  189. 3.187
    M.Balooch, R.Behrens, D. R.Olander: Private communicationGoogle Scholar
  190. 3.188
    S. L. Bernasek, G. A. Somorjai: J. Chem. Phys. 62, 3149 (1975)Google Scholar
  191. 3.189
    K.J.Dietz, F.Waelbroeck, P.Wienhold: Jülich-IPP-Report 1448 (1977)Google Scholar
  192. 3.190
    B. Lersmacher, H. Lydtin, W. F. Knippenberg, A. W. Moore: Carbon 5, 205 (1967)Google Scholar
  193. 3.191
    JANAF Thermo-Chemical Tables, eds. by D. R. Stull, H. Prophet, NSRDS-NBS 37 (1971)Google Scholar
  194. 3.192
    M.Balooch: Jpn. Appl. Phys. 16, 1557 (1977)Google Scholar
  195. 3.193
    J. C. Batty, R. E. Stickney: J. Chem. Phys. 51, 4475 (1969)Google Scholar
  196. 3.194
    J. C. Batty, R. E. Stickney: Research Lab. of Electronics. MIT Tech. Rpt. 473 (1969)Google Scholar
  197. 3.195
    Handbook of Physics, eds. by E. V. London, H. Ochshaw (McGraw-Hill, New York 1958)Google Scholar
  198. 3.196
    C.Pisani, R. Ricca, R.Dovesi: Proc. 2nd Intern. Conf. Solid Surf. Jpn. J. Appl. Phys. Suppl. 2, Pt. 2, 269 (1974)Google Scholar
  199. 3.197
    D. R.Olander, T. R. Acharya, A. Z. Ullman: J. Chem. Phys. 67, 3549 (1977)Google Scholar
  200. 3.198
    G.N.-K.Liu: MIT Tech. Rpt. 186 (1973)Google Scholar
  201. 3.199
    K. Flaskamp, H. R.Ihle, G. Stöcklin, E. Vietzke, K. Vogelbruch, C. H. Wu:Proc. Intern. Symp. Plasma Wall Interaction, Jülich (1976) p. 285Google Scholar
  202. 3.200
    P.Hucks, K. Flaskamp, E. Vietzke: J. Nucl. Mater. 93/94, 558 (1980)Google Scholar
  203. 3.201
    G.Beitel: J. Vac. Sci. Technol. 8, 647 (1971)Google Scholar
  204. 3.202
    G. Beitel: J. Vac. Sci. Technol. 6, 224 (1968)Google Scholar
  205. 3.203
    E. Taglauer, W. Heiland: J. Nucl. Mater. 76/77, 328 (1978)Google Scholar
  206. 3.204
    S.K.Erents: Nucl. Instrum. Methods 170, 455 (1980)Google Scholar
  207. 3.205
    J. N. Smith, Jr., C. H. Meyer, Jr.: J. Nucl. Mater. 76/77, 193 (1978)Google Scholar
  208. 3.206
    A. Sagara, K. Kamada: J. Nucl. Mater. 111/112, 812 (1982)Google Scholar
  209. 3.207
    K. Watanabe, K. Nakamura, S. Maeda, Y. Hirohata, M. Mohri, T. Yamashina: J. Nucl. Mater. 85/86, 1081 (1979)Google Scholar
  210. 3.208
    R. Brewer, S.Vepřek, T. Yamashina, S. Maeda, M. Mohri: IEA Workshop on Graphite, RigiKaltbad, Swizerland (Oct. 1982) to be publishedGoogle Scholar
  211. 3.209
    R. Yamada, K. Nakamura, K. Sone, M. Saidoh: J. Nucl. Mater. (to be published)Google Scholar
  212. 3.210
    W.Eckstein: Private communication (1981)Google Scholar

Copyright information

© Springer-Verlag 1983

Authors and Affiliations

  • Joachim Roth

There are no affiliations available

Personalised recommendations