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Prediction of Plasma Enhanced Deposition Process Using GA-Optimized GRNN

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Advances in Neural Networks - ISNN 2006 (ISNN 2006)

Part of the book series: Lecture Notes in Computer Science ((LNTCS,volume 3973))

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Abstract

A genetic algorithm (GA)-based optimization of generalized regression neural network (GRNN) was presented and evaluated with statistically characterized plasma deposition data. The film characteristics to model were deposition rate and positive charge density. Model performance was evaluated as a function of two training factors, the spread range and a factor employed for balancing training and prediction errors. For comparison, GRNN models were constructed as well as four types of statistical regression models. Compared to conventional GRNN models, GA-GRNN models improved the prediction accuracy considerably by about 50% for either film characteristic. The improvements over statistical regression models were more pronounced and they were more than 60%. There results clearly reveal that the presented technique can significantly improve conventional GRNN predictions.

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Author information

Authors and Affiliations

  1. Department of Electronic Engineering, Sejong University, Seoul, Korea

    Byungwhan Kim & Dukwoo Lee

  2. Department of Information Engineering, Myongji University, Yongin, Korea

    Seung Soo Han

Authors
  1. Byungwhan Kim
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  2. Dukwoo Lee
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  3. Seung Soo Han
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Editor information

Editors and Affiliations

  1. Department of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong, China

    Jun Wang

  2. Computational Intelligence Laboratory, School of Computer Science and Engineering, University of Electronic Science and Technology of China, 610054, Chengdu, P.R. China

    Zhang Yi

  3. Department of Electrical Engineering, University of Louisville, 40292, Louisville, KY, U.S.A

    Jacek M. Zurada

  4. Laboratory for Computational Biology, Shanghai Center for Systems Biomedicine, 800 Dong Chuan Rd, 200240, Shanghai, China

    Bao-Liang Lu

  5. School of Electrical and Electronic Engineering, University of Manchester, UK

    Hujun Yin

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© 2006 Springer-Verlag Berlin Heidelberg

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Kim, B., Lee, D., Han, S.S. (2006). Prediction of Plasma Enhanced Deposition Process Using GA-Optimized GRNN. In: Wang, J., Yi, Z., Zurada, J.M., Lu, BL., Yin, H. (eds) Advances in Neural Networks - ISNN 2006. ISNN 2006. Lecture Notes in Computer Science, vol 3973. Springer, Berlin, Heidelberg. https://doi.org/10.1007/11760191_149

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  • DOI: https://doi.org/10.1007/11760191_149

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-34482-7

  • Online ISBN: 978-3-540-34483-4

  • eBook Packages: Computer ScienceComputer Science (R0)

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