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Scientific and Technological Issues Related to Rare Earth Oxides: An Introduction

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Rare Earth Oxide Thin Films

Part of the book series: Topics in Applied Physics ((TAP,volume 106))

Abstract

Significant research effort is currently being devoted to study deposition, dielectric, and electronic properties of binary rare earth oxides, as well as of complex oxides based on rare earth elements. Most of the motivations justifying this effort are found in the field of microelectronics – especially in the search of high dielectric constant oxides as candidates to substitute SiO2 – and these will be mostly discussed. Open problems and issues from the scientific and technological point of view are discussed, and applications in fields other than microelectronics (such as spintronics) are also mentioned.

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Authors and Affiliations

  1. CNR-INFM MDM, National Laboratory, Via C. Olivetti 2, 20041, Agrate Brianza (MI), Italy

    Giovanna Scarel & Marco Fanciulli

  2. Department of Physics and Astronomy, University of Åårhus, Ny Munkegade, DK 8000, Åårhus, Denmark

    Axel Svane

Authors
  1. Giovanna Scarel
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  2. Axel Svane
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  3. Marco Fanciulli
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Marco Fanciulli Giovanna Scarel

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Scarel, G., Svane, A., Fanciulli, M. Scientific and Technological Issues Related to Rare Earth Oxides: An Introduction. In: Fanciulli, M., Scarel, G. (eds) Rare Earth Oxide Thin Films. Topics in Applied Physics, vol 106. Springer, Berlin, Heidelberg . https://doi.org/10.1007/11499893_1

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