Abstract
Multilayered films with nanometer sized single layers are important as mirrors for extreme ultraviolet radiation or soft x-rays. Oxide systems are promising multilayers for the so-called water-window (between 2.4 and 4.4 nm wavelength). Oxygen is transparent for radiation at this wavelength, and oxides are known to form very smooth, stable interfaces without interdiffusion. In this paper we present tungsten oxide / silicon oxide multilayers, deposited by plasma assisted chemical vapor deposition (PECVD). We deposited multilayer systems consisting of up to 80 individual layers, with single layers of less than one nanometer. The roughness of the layer interfaces is low enough to avoid island formation.
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References
E. Spiller, Appl. Phys. Lett. 20, 365 (1972).
U. Kleineberg, T. Westerwalbesloh, W. Hachmann, U. Heinzmann, J. Tümmler, G. Ulm, S. Müllender, Thin Solid Films 433, 230 (2003).
S. Braun, H. Mai, M. Moss, R. Scholz, A. Leson, Jpn. J. Appl. Phys. 41, 4074 (2002).
F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358, 90 (2000).
A. Wonisch, T. Westerwalbesloh, W. Hachmann, N. Kabachnik, U. Kleineberg, U. Heinzmann, Thin Solid Films 464–465, 473 (2004).
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Hamelmann, F., Wonisch, A., Hachmann, W., Heinzmann, U. (2006). Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In: Kassing, R., Petkov, P., Kulisch, W., Popov, C. (eds) Functional Properties of Nanostructured Materials. Nato Science Series, vol 223. Springer, Dordrecht. https://doi.org/10.1007/1-4020-4594-8_27
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DOI: https://doi.org/10.1007/1-4020-4594-8_27
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-4020-4595-0
Online ISBN: 978-1-4020-4594-3
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