Abstract
Density-functional theory calculations are employed to obtain important information about the morphology of III–V semiconductor surfaces and kinetics of epitaxial growth. In this way, insight into the microscopic processes governing quantum dot formation in InAs/GaAs(001) heteroepitaxy is gained. First, we investigate theoretically the atomic structure and thermodynamics of the wetting layer formed by InAs deposition on GaAs(001), including the effect of strain in our discussion. Secondly, we present results about In adatom diffusion both on the wetting layer and on the c(4 × 4)-reconstructed GaAs(001) surface. In the latter case, we demonstrate the importance of mechanical stress for the height of surface diffusion barriers. Implications for the growth of InAs quantum dots on GaAs(001) are discussed.
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Penev, E., Kratzer, P. (2005). First-Principles Study of InAs/GaAs(001) Heteroepitaxy. In: Joyce, B.A., Kelires, P.C., Naumovets, A.G., Vvedensky, D.D. (eds) Quantum Dots: Fundamentals, Applications, and Frontiers. NATO Science Series, vol 190. Springer, Dordrecht. https://doi.org/10.1007/1-4020-3315-X_2
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