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Microfabrication of Transparent Materials by Laser Processing

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Photo-Excited Processes, Diagnostics and Applications

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Abstract

Microfabrication of transparent materials by laser processing is challenging due to the high transparency of many materials of interest in the near ultraviolet (UV)-visible region. This chapter gives the processing details of fused silica and other transparent materials by pulsed-laser irradiation involving: (1) Direct excitation of transparent materials with high-intensity UV lasers, femtosecond lasers, vacuum ultraviolet (VUV) lasers, and (2) Indirect excitation of the substrate by conventional manosecond pulsed lasers. The indirect-excitation method using laser-induced backside wet etching (LIBWE) to etch transparent materials by laser ablation of an organic solution is described in detail.

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Authors and Affiliations

  1. Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki, 305-8565, Japan

    Yoshizo Kawaguchi, Hiroyuki Niino & Akira Yabe

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  1. Yoshizo Kawaguchi
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  2. Hiroyuki Niino
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  3. Akira Yabe
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Editors and Affiliations

  1. Holon Academic Institute of Technology, Israel

    A. Peled

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Kawaguchi, Y., Niino, H., Yabe, A. (2003). Microfabrication of Transparent Materials by Laser Processing. In: Peled, A. (eds) Photo-Excited Processes, Diagnostics and Applications. Springer, Boston, MA. https://doi.org/10.1007/1-4020-2610-2_12

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  • DOI: https://doi.org/10.1007/1-4020-2610-2_12

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4020-7527-8

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