13.10 Summary
Jet Vapor Deposition holds much promise for high rate, low cost manufacture of HTS tape. At low rates, JVD has proven its ability to deposit multicomponent oxides such as the ferrites and ferroelectrics, as well as HTS buffer layers and sandwiches of CeO2 and YSZ. For more demanding future production, the versatile “e-jet” JVD source offers powerful advantages: high rate deposition of manyHTS oxides, synthesis from elemental metals or bulk HTS oxides, easy replenishment of lost oxygen, control of crystallinity via low energy, extreme-high ion current bombardment, and control of surface reaction conditions on rolled, textured Ni substrates. Added to these advantages is the absence of environmental threat; there are no toxic precursors or products in JVD. For economic, continuous manufacture, the JVD stripcoater features a simple but unique air-to-vacuum seal that enables reel-to-reel production in a low cost, small footprint system. Accelerating work at Jet Process Corporation is aimed at realizing these advantages for HTS production.
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Halpern, B.L., Tamagawa, T., Di, Y. (2005). Jet Vapor Deposition for Continuous, Lowcost Manufacture of High Temperature Superconducting Tape. In: Goyal, A. (eds) Second-Generation HTS Conductors. Springer, Boston, MA. https://doi.org/10.1007/0-387-25839-6_13
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DOI: https://doi.org/10.1007/0-387-25839-6_13
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