High-Speed Laser Heat-Mode Lithography on Chalcogenide Resists

  • Jingsong WeiEmail author
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 291)


As is well known, the photolithography patterns are generally written on organic resists. The organic resists are large molecular-weight long-chain compounds (polymers) [1, 2]. The photolithography exposure is due to photo-induced glass transition effect. The exposure dose is required to be low, and thus the organic resist can be used in the projection (mask) lithography.


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© Springer Nature Singapore Pte Ltd. 2019

Authors and Affiliations

  1. 1.Shanghai Institute of Optics and Fine MechanicsChinese Academy of SciencesShanghaiChina

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