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Application of Ion Beam Etching Technology in Spacecraft Encoder Lithography

  • Suran QinEmail author
  • Na Zhao
  • Ronghui Jiao
  • Chunying Zhu
  • Jiang Liu
  • Jianmin Shi
  • Hanchao Fan
Conference paper
Part of the Lecture Notes in Electrical Engineering book series (LNEE, volume 550)

Abstract

The encoder is a core component of encoding sun sensor, the photolithography precision and quality has the serious impact on the measurement accuracy of sun sensor. Traditional encoder photolithography uses wet etching technology, and line edge has sawtooth and burr phenomenon, photolithography accuracy is low, can not meet the aerospace products high precision and high quality requirements. In this paper, iron beam etching technique is used to verify the feasibility of ion beam etching technology used in encoder, which solves the problem of edge sawtooth and burr, and the technical problems of low photolithography accuracy, which laid the foundation for the further development of products to higher precision.

Keywords

Ion beam etching Photolithography Quality improvement 

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Copyright information

© Springer Nature Singapore Pte Ltd. 2019

Authors and Affiliations

  • Suran Qin
    • 1
    Email author
  • Na Zhao
    • 2
  • Ronghui Jiao
    • 3
  • Chunying Zhu
    • 2
  • Jiang Liu
    • 2
  • Jianmin Shi
    • 2
  • Hanchao Fan
    • 2
  1. 1.Beijing Institute of Spacecraft System EngineeringBeijingChina
  2. 2.Beijing Institute of Control EngineeringBeijingChina
  3. 3.China Academy of Space TechnologyBeijingChina

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