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Sub-Diffraction-Limited Nanolithography

  • Xiangang LuoEmail author
Chapter

Abstract

Sub-diffraction-limited nanolithography is one of the main applications in EO 2.0. In this chapter, we first give a brief introduction about the diffraction-limited lithography and the significance of breaking diffraction limit. Then we would like to summarize the research achievements of plasmonic lithography in the manners of interference, imaging, and direct writing. Some representative techniques are described in detail. The key aspects in evaluating the performance of plasmonic lithography are also discussed, such as resolution, fidelity, and the aspect ratio of nanopatterns. Some new physics and materials accompanying plasmonic devices design as well as lithography are presented. Subsequently, we discuss the engineering aspects of plasmonic lithography, like depth amplification and pattern transfer, resolution enhancement, and precision systems. In addition, practical applications of plasmonic lithography are introduced. The remaining problems and outlooks of plasmonic lithography are given in the end.

Keywords

Plasmonic lithography Diffraction limit Evanescent waves 

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© Springer Nature Singapore Pte Ltd. 2019

Authors and Affiliations

  1. 1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and ElectronicsChinese Academy of SciencesChengduChina

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