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Effect of Mg Concentration on the Structural, Morphological and Optical Properties of Ternary ZnMgO Nanocrystalline Thin Films

  • Shashikant RajpalEmail author
  • S. R. Kumar
Conference paper

Abstract

A technological challenge is to develop a ternary semiconductor ZnMgO thin film by controlling the concentration of Mg in aqueous medium that allows us to tune the band gap energy between 3.35 and 3.55 eV. In this paper, ZnMgxO (x = 0.00263, 0.00525 and 0.01313 M) films were deposited on zinc substrate containing Na3C6H5O7 × 2H2O, MgCl2 × 6H2O and 30% H2O2 in 40 ml of distilled water. The electrodeposition technique is used to develop the film. The structural, morphological, compositional analysis and optical properties of different concentration of developed ZnMgO thin films were studied by XRD, SEM, EDS, UV–Vis and PL. The diffraction peak observed at 2θ ≃ 36° with preferred plane indicates the crystalline nature of ZnMgO film. Grain size has been calculated by using Scherrer formula. A SEM photograph shows that grains are uniform and densely distributed over the surface. Compositional analysis reveals the presence of Zn, Mg and O. With increase in Mg concentration, the optical energy band gap of ZnMgO films varied from 3.42 to 3.52 eV and photoluminescence emission of ZnMgO film were also observed.

Keywords

Concentration Characterization Optical Structural Thin films ZnMgO 

Notes

Acknowledgements

Authors are very much thankful to fund provided by Ministry of HRD, Government of India. We are also thankful to Central facilities of Birla Institute of Technology, Ranchi, for different analyses.

References

  1. 1.
    Hsin Chiang You. Indium Doping Concentration Effects in the Fabrication of Zinc-Oxide Thin-Film Transistors. Int. J. Electrochem. Sci. 2013; 8: 9773–9784.Google Scholar
  2. 2.
    Norris BJ., Anderson J, Wager JF, Keszler DA. Spin-coated zinc oxide transparent transistors. J. Phys. D: Appl. Phys. 2003, 36:105.CrossRefGoogle Scholar
  3. 3.
    Choi JH, Kar JP, Khang DY, young M. Enhanced performance of ZnO nanocomposite transistor by simple mechanical compression. J., J. Phys. Chem. 2009; 113:5010.CrossRefGoogle Scholar
  4. 4.
    Sun B, Sirringhaus H. Solution-Processed Zinc Oxide Field-Effect Transistors Based on Self-Assembly of Colloidal Nanorods. Nanolett 2005; 5: 2408.CrossRefGoogle Scholar
  5. 5.
    Choi WS, Yoonb JG. Optical characterization of band gap graded ZnMgO films, Solid State Communications 2012; 152: 345–348.CrossRefGoogle Scholar
  6. 6.
    Janotti A, Walle CGVD, Fundamentals of zinc oxide as a semiconductor. Rep. Prog. Phys. 2009; 72: 126501.CrossRefGoogle Scholar
  7. 7.
    Kang TD, Hosun L, Won P, Chul YG, J. Korean Phys. Soc 2004; 44:129–132.Google Scholar
  8. 8.
    Gowrishankar S, Balakrishnan L, Gopalakrishnann N. Band gap engineering in Zn (1- x) Cd x O and Zn (1- x) Mg x O thin films by RF sputtering. Ceramics International2014; 40: 2135–2142.Google Scholar
  9. 9.
    Rivera A, Mazady A, Anwar M. Co-axial core–shell ZnMgO/ZnO NWs. Solid-State Electronics 2015; 104:126–130.CrossRefGoogle Scholar
  10. 10.
    Hua SY, Chou WC, Weng YH. Effects of magnesium contents in ZnMgO ternary alloys grown by molecular beam epitaxy. Journal of Alloys and Compounds 2015; 636: 81–84.CrossRefGoogle Scholar
  11. 11.
    Zhang X, Li XM, Chen TL, Bian JM, Zhang CY. Structural and optical properties of Zn1-xMgxO thin films deposited by ultra sonic spray pyrolysis. Thin Solid Films 2005; 492: 248–252.Google Scholar
  12. 12.
    Maemoto T, Ichiba N, Ishii H, Sasa S, Inoue M. Structural and optical properties of ZnMgO thin films grown by pulsed laser deposition using ZnO-MgO multiple target. Journal of Physics: Conference Series 2007; 59: 670–673.Google Scholar
  13. 13.
    Heo YH, Varadarjan V, Kaufman M, Kim K, Norton DP, Ren F, Site-specific growth of Zno nanorods using catalysis-driven molecular-beam epitaxy, Appl Phys Lett 2002;81:3046.CrossRefGoogle Scholar
  14. 14.
    Xu L, Su J, Chen Y, Zheng G, Pei S, Sun T, Wanga JF, Lai M, Journal of Alloys and Compounds, 2013;548: 7–12.CrossRefGoogle Scholar
  15. 15.
    Karuppuchamy S, Ito S. Cathodic electrodeposition of nanoporous ZnO thin films from new electrochemical bath and their photo induced hydrophilic properties, Vacuum 2008;82: 547–550.CrossRefGoogle Scholar
  16. 16.
    Cullity BD. Elements of x-ray diffraction. USA: Addison-wesley Reading, 1972.Google Scholar
  17. 17.
    Lin MC, Chen PY, Sun IW. Electrodeposition of Zinc Telluride from a Zinc Chloride-1-Ethyl-3-methylimidazolium Chloride Molten Salt. Journal of The Electrochemical Society 2001; 148 (10):C653–C658.CrossRefGoogle Scholar
  18. 18.
    Sivaraman T, Nagarethinam VS, Balu AR. CdS thin films fabricated by a simplified spray technique from different substrate temperatures-Structural, morphological, optical and electrical analysis. Res. J.Mater. Sci. 2014; 2: 6.Google Scholar

Copyright information

© Springer Nature Singapore Pte Ltd. 2019

Authors and Affiliations

  1. 1.Department of Applied Sciences and HumanitiesNational Institute of Foundry and Forge TechnologyRanchiIndia

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