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Secondary Electron Yield of Nano-Thick Aluminum Oxide and its Application on MCP Detector

  • Baojun Yan
  • Shulin Liu
  • Kaile Wen
  • Yuzhen Yang
  • Tianchi Zhao
  • Peiliang Wang
  • Yuekun Heng
Conference paper
Part of the Springer Proceedings in Physics book series (SPPHY, volume 213)

Abstract

Nano-thick aluminum oxide thin film was deposited by atomic layer deposition (ALD) technique. The secondary electron properties of such thin film have been studied by pulsed-yield measurement. Conventional lead glass microchannel plate (MCP) was coated with such thin film. The gain, the single electron resolution and the peak-to-valley ratio of the new MCP detector were improved.

Keywords

Atomic layer deposition Secondary electron yield Aluminum oxide Microchannel plate 

Notes

Acknowledgement

This work is supported by the National Natural Science Foundation of China (Grant Nos. 11675278 and 11535014), Beijing Municipal Science and Technology Project (Grant No. Z171100002817004) and the Equipment Development Program of the Chinese Academy of Sciences.

References

  1. 1.
    Fijol, J.J., Then, A.M., Tasker, G.W.: Secondary electron yield of SiO2 and Si3N4 thin films for continuous dynode electron multipliers. Appl. Surf. Sci. 48(49), 464–471 (1991)ADSCrossRefGoogle Scholar
  2. 2.
    Mane, A.U., Peng, Q., Elam, J.W., et al.: An atomic layer deposition method to fabricate economical and robust large area microchannel plates for photodetectors. Phys. Procedia 37, 722–732 (2012)ADSCrossRefGoogle Scholar
  3. 3.
    Yan, B.J., Liu, S.L., Heng, Y.K.: Nano-oxide thin films deposited via atomic layer deposition on microchannel plates. Nanoscale Res. Lett. 10, 162 (2015)ADSCrossRefGoogle Scholar
  4. 4.
    Beaulieu, D.R., Gorelikov, D., de Rouffignac, P., Saadatmand, K., Stenton, K., Sullivan, N., Tremsin, A.S.: Nano-engineered ultra-high-gain microchannel plates. Nucl. Instr. Meth. Phys. Res. A 607, 81–84 (2009)ADSCrossRefGoogle Scholar
  5. 5.
    Yan, B.J., Liu, S.L., Yang, Y.Z., Heng, Y.K.: Band alignment of atomic layer deposited MgO/Zn0.8Al0.2O heterointerface determined by charge corrected X-ray photoelectron spectroscopy. Appl. Surf. Sci. 371, 118–128 (2016)ADSCrossRefGoogle Scholar
  6. 6.
    Yan, B.J., Liu, S.L., Heng, Y.K., Yang, Y.Z., Yu, Y., Wen, K.L.: Band offset measurements in atomic-layer-deposited Al2O3/Zn0.8Al0.2O heterojunction studied by X-ray photoelectron spectroscopy. Nanoscale Res. Lett. 12, 363 (2017)ADSCrossRefGoogle Scholar
  7. 7.
    Wen, K.L., Liu, S.L., Yan, B.J., Yu, Y., Yang, Y.Z.: Spherical measuring device of secondary electron emission coefficient based on pulsed electron beam. In: Proceedings of International Conference on Technology and Instrumentation in Particle Physics (2017). (Accepted)Google Scholar
  8. 8.
    Yang, Y.Z., Liu, S.L., Zhao, T.C., Yan, B.J., Wang, P.L., Yu, Y., Lei, X.C., Yang, L.P., Wen, K.L., Qi, M., Heng, Y.K.: Single electron counting using a dual MCP assembly. Nucl. Instr. Meth. Phys. Res. A 830, 438–443 (2016)ADSCrossRefGoogle Scholar
  9. 9.
    Yang, Y.Z., Yan, B.J., Liu, S.L., Zhao, T.C., Yu, Y., Wen, K.L., Li, Y.M., Qi, M.: MCP performance improvement using alumina thin film. Nucl. Instr. Meth. Phys. Res. A 868, 43–47 (2017)ADSCrossRefGoogle Scholar

Copyright information

© Springer Nature Singapore Pte Ltd.  2018

Authors and Affiliations

  • Baojun Yan
    • 1
  • Shulin Liu
    • 1
  • Kaile Wen
    • 1
    • 2
  • Yuzhen Yang
    • 1
    • 3
  • Tianchi Zhao
    • 1
    • 4
  • Peiliang Wang
    • 1
  • Yuekun Heng
    • 1
  1. 1.State Key Laboratory of Particle Detection and ElectronicsInstitute of High Energy Physics of Chinese Academy of SciencesBeijingChina
  2. 2.University of Chinese Academy of SciencesBeijingChina
  3. 3.School of PhysicsNanjing UniversityNanjingChina
  4. 4.Department of PhysicsUniversity of WashingtonSeattleUSA

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