Secondary Electron Yield of Nano-Thick Aluminum Oxide and its Application on MCP Detector
Nano-thick aluminum oxide thin film was deposited by atomic layer deposition (ALD) technique. The secondary electron properties of such thin film have been studied by pulsed-yield measurement. Conventional lead glass microchannel plate (MCP) was coated with such thin film. The gain, the single electron resolution and the peak-to-valley ratio of the new MCP detector were improved.
KeywordsAtomic layer deposition Secondary electron yield Aluminum oxide Microchannel plate
This work is supported by the National Natural Science Foundation of China (Grant Nos. 11675278 and 11535014), Beijing Municipal Science and Technology Project (Grant No. Z171100002817004) and the Equipment Development Program of the Chinese Academy of Sciences.
- 7.Wen, K.L., Liu, S.L., Yan, B.J., Yu, Y., Yang, Y.Z.: Spherical measuring device of secondary electron emission coefficient based on pulsed electron beam. In: Proceedings of International Conference on Technology and Instrumentation in Particle Physics (2017). (Accepted)Google Scholar