Preparation of Large Size Monolayer MoS2 by a Two-Step Heating Process by CVD

Conference paper
Part of the Lecture Notes in Mechanical Engineering book series (LNME)

Abstract

Due to their fascinating properties, two-dimensional monolayer transition metal dichalcogenides (TMDs) have attracted a lot research interests in the recent years. Chemical vapor deposition (CVD) is the most effective way to grow monolayer TMDs in large area. However, to grow high quality monolayer TMDs controllably by CVD is still a challenge. Here, a two-step heating CVD process was developed to grow monolayer MoS2, which the crystal size is obviously larger than that grown by traditional one-step heating CVD process. The effects of growing time and the distance from the Mo source to the size and density of MoS2 crystals are also studied. The largest size of individual MoS2 triangle reaches 62 µm in edge length.

Keywords

MoS2 CVD Monolayer Growth Heating process 

Notes

Acknowledgements

This work was supported by NSF of China (Grant No. 61775006 and 11374022).

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Copyright information

© Springer Nature Singapore Pte Ltd. 2018

Authors and Affiliations

  • Fengjiao Lv
    • 1
  • Yi Zeng
    • 1
  • Bo Liu
    • 1
  • Bin Tang
    • 1
  • Qing Chen
    • 1
  1. 1.Key Laboratory for the Physics and Chemistry of Nanodevices, Department of ElectronicsPeking UniversityBeijingChina

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