Advanced Architectures for 3D NAND Flash Memories with Vertical Channel

Chapter

Abstract

One of the key metrics to benchmark different 3D architectures is the storage density, which is here indicated with Bit_Density. Given a specific Flash memory die, this density is defined as the ratio between the storage capacity of the die, Die_Capacity, and its silicon area, Die_Size. In this chapter we present some of the most advanced architectures of 3D arrays with vertical channels, which were mainly developed to increase Bit_Density and reduce the Source Line effect.

Keywords

Line Contact Charge Pump Vertical Channel Control Gate Silicon Area 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

References

  1. 1.
    R. Micheloni, L. Crippa, A. Marelli, Inside NAND Flash Memories (Springer, Berlin, 2010)Google Scholar
  2. 2.
    K. Parat, C. Dennison, A floating gate based 3D NAND technology with CMOS under array, in IEDM, 7 Dec 2015Google Scholar
  3. 3.
    Y. Komori et al., Disturbless flash memory due to high boost efficiency on BiCS structure and optimal memory film stack for ultra high density storage device, in IEDM Technical Digest (2008), pp. 851–854Google Scholar
  4. 4.
    R. Micheloni, A. Marelli, K. Eshghi, Inside Solid State Drives (SSDs) (Springer, Berlin, 2013)Google Scholar
  5. 5.
    K.-T. Park, Three-dimensional 128 Gb MLC vertical NAND flash memory with 24-WL stacked layers and 50 MB/s high-speed programming, in IEEE ISSCC Digest Technical Papers, pp. 334–335, 2014Google Scholar
  6. 6.
    K.-T. Park, Three-dimensional 128 Gb MLC vertical NAND flash memory with 24-WL stacked layers and 50 MB/s high-speed programming. IEEE J. Solid-State Circ. 50(1) (2015)Google Scholar
  7. 7.
    K.T. Park, A World’s First Product of Three-Dimensional Vertical NAND Flash Memory and Beyond, NVMTS 27–29 Oct 2014Google Scholar
  8. 8.
    D.-H. Lee, A new cell-type string select transistor in NAND flash memories for under 20 nm node, in 4th IEEE International Memory Workshop (IMW), Milan, May 2012, pp. 1–3Google Scholar
  9. 9.
    J.-W. Im, 128 Gb 3b/cell V-NAND flash memory with 1 Gb/s I/O rate, in 2015 IEEE International Solid-State Circuits Conference (2015) pp. 130–131Google Scholar
  10. 10.
    W. Jeong, 128 Gb 3b/cell V-NAND flash memory with 1 Gb/s I/O rate. J. Solid-State Circ. 51(1) (2016)Google Scholar

Copyright information

© Springer Science+Business Media Dordrecht 2016

Authors and Affiliations

  1. 1.Performance Storage BUMicrosemi CorporationVimercateItaly

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