Investigation into Molecular Beam Epitaxy-Grown FETs and HEMTs

  • S. Mottet
  • J. M. Dumas
Chapter
Part of the NATO ASI Series book series (NSSE, volume 175)

Abstract

An investigation into molecular beam epitaxy-grown FETs and HEMTs has been carried-out. Reliability life-tests have been driven on both AlGaAs/GaAs conventional and AlAs/GaAs superlattice HEMTs. Power MESFETs including an AlGaAs undoped buffer layer for electron confinement in the channel have been also studied. For all these devices the influence of laser desorption during the MBE growth process has been assessed in terms of performance improvements and stability of FET structures. Moreover, the main parasitic effects penalizing this large scale integration of HEMT-based ICs have been experimentally characterized and investigated together with the related modelling.

Keywords

Buffer Layer High Electron Mobility Transistor GaAs Buffer Layer Buffer Layer Thickness Kink Effect 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. [1]
    Mottet, S. and Le Mouellic, C. (1984) “GaAs MESFET anomalies related to minority carrier injection into semi-insulating substrate” in D. C. Look and J. S. Blakemore (Eds.), Semi-Insulating III–V Materials, Shiva Publishing Ltd England, 406–409Google Scholar
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    Viallet, J.E. and Mottet, S. (1985) “Heterojunction under Fermi-Dirac statistics: general set of equations and steady state numerical methods” in J.J.H. Miller (Ed.), Proceedings of the Fourth International Conference on the Numerical Analysis of Semiconductor Devices and Integrated Circuits, Boole Press ltd. Ireland, 530–535Google Scholar
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    Mottet, S. and Viallet, J.E. (I986) “Simulation of III-V device semi-insulating material” in K. Board and D.R.J. Owen (Eds.), Simulation of Semiconductor Devices and Processes, Vol. 2, Pineridge Press G.B, 494–507Google Scholar
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    Zebbar, N. (1987) “Effet du substrat semi-isolant GaAs sur le comportement des transistors MESFET à l’arseniure de gallium”, Thèse de doctorat, USTHB, AlgerGoogle Scholar

Copyright information

© Kluwer Academic Publishers 1990

Authors and Affiliations

  • S. Mottet
    • 1
  • J. M. Dumas
    • 1
  1. 1.Centre National d’Etudes des TélécomunicationsLannionFrance

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