Reactive Ion Beam Etching Studies of Tungsten with CF4 Using Ion Scattering Spectroscopy

  • T. I. Cox
  • V. G. I. Deshmukh
  • D. G. Armour
Chapter
Part of the NATO ASI Series book series (NSSE, volume 176)

Abstract

Reactive ion beam etching (RIBE) offers intrinsic interest as an etch technique and its comparatively low operating pressure (10-4 torr in the bombardment chamber) allows the application of ion beam based surface analytical techniques to monitor the surface during etching. We report here on the RIBE of tungsten with a reactive ion beam generated from a carbon tetrafluoride (CF4)/argon (Ar) gas mixture.

Keywords

Tungsten Surface Outermost Surface Layer Hemispherical Energy Analyser Carbon Tetrafluoride Bombardment Chamber 
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Copyright information

© Kluwer Academic Publishers 1990

Authors and Affiliations

  • T. I. Cox
    • 1
  • V. G. I. Deshmukh
    • 1
  • D. G. Armour
    • 2
  1. 1.Royal Signals and Radar EstablishmentWorcestershireUK
  2. 2.Department of Electronic and Electrical EngineeringUniversity of SalfordSalfordUK

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