Abstract
Deposition of chromium oxide films by Ar+ laser photolysis of chromyl chloride vapors has been recently demonstrated1. Photolytic reactions in the adsorbed layer allowed the deposition of CrO2 films on dielectric and semiconducting substrates using 488 nm radiation, with resolution down to 1 μm. Also, by photoinitiated pyrolysis of the vapor phase, single Cr2O3 filamentary crystals were grown. In this contribution a novel technique for film deposition is presented, together with optical and electrical characterization.
Work supported by Italian CNR and MPI.
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© 1988 Martinus Nijhoff Publishers
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Arnone, C., Zizzo, C. (1988). Physical Properties of Laser Written Chromium Oxide Thin Films. In: Ehrlich, D.J., Nguyen, V.T. (eds) Emerging Technologies for In Situ Processing. NATO ASI Series, vol 139. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1409-4_25
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DOI: https://doi.org/10.1007/978-94-009-1409-4_25
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-7130-7
Online ISBN: 978-94-009-1409-4
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