Diffusion: Predeposition

  • George E. Anner

Abstract

Diffusion is a process used for forming p-n junctions in semiconductor devices. A particular atomic species, having a nonuniform distribution and undergoing random thermal motion, suffers a directed motion by diffusion from regions of higher to lower concentration of that species. It is a highly temperature dependent process.

Keywords

Silicon Wafer Local Source Boron Nitride Sheet Resistance Furnace Tube 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Van Nostrand Reinhold 1990

Authors and Affiliations

  • George E. Anner
    • 1
  1. 1.University of IllinoisChampaign-UrbanaUSA

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