Advanced Generation-Recombination Models
Abstract
In 1934 Zener [3.118] proposed band-to-band tunneling as explanation for the electrical breakdown. A modified Zener theory was used by McAffee et al. [3.75] in 1951 to describe the breakdown of reversed biased pn-junctions, called Zener diodes since then. However, experimental work [3.76–3.78] in the following years showed that in such diodes with wide junctions the breakdown is not caused by tunneling, but by impact ionization. Only in narrow junctions, where the width of the transition region is less than 50 nm, the necessary field strength for tunneling is reached before the avalanche effect sets in. This was first clearly demonstrated by Chynoweth and McKay [3.22] in 1957 by the absence of microplasma noise and by the temperature coefficients of reverse and forward characteristics of junctions with different breakdown voltages. In the same year Esaki [3.32] discovered that narrow pn-junctions between degenerate regions can have forward characteristics with a portion of negative differential conductivity, and that the tunnel “hump” is only weakly temperature dependent. Esaki’s work initiated intensive experimental and theoretical investigations. Holonyak et al. [3.53] and Hall [3.45] observed structures in the I (V)-characteristics of heavily doped Si-junctions at 4.2 K, which they attributed to the momentum-conserving phonons in indirect band-to-band tunneling. Various phonon energies could be resolved in these characteristics. Chynoweth et al. [3.19, 3.20] then found evidence that the excess current in silicon Esaki junctions, i.e. the current between the tunnel “hump” and the normal forward injection current, is essentially caused by the process of field ionization of impurity levels.
Keywords
Tunneling Rate Field Enhancement Factor Direct Tunneling Excess Current Classical Turning PointPreview
Unable to display preview. Download preview PDF.
References
- [3.1]M. Abramowitz and I. A. Stegun. Handbook of Mathematical Functions with Formulas, Graphs, and Mathematical Tables. Dover Publications, New York, 1972.MATHGoogle Scholar
- [3.2]E. N. Adams. The Crystal Momentum as a Quantum Mechanical Operator. J. chem. Phys., 21(11):2013–17, 1953.CrossRefGoogle Scholar
- [3.3]D. E. Aspnes. Electric-Field Effects on Optical Absorption. Phys. Rev., 147:554–561, 1966.CrossRefGoogle Scholar
- [3.4]D. E. Aspnes. Electric Field Effects on the Dielectric Constant of Solids. Phys. Rev., 153:972–982, 1967.CrossRefGoogle Scholar
- [3.5]D. E. Aspnes, P. Handler, and D. F. Blossey. Inerband Dielectric Properties of Solids in an Electric Field. Phys. Rev., 166 (3):921–933, 1968.CrossRefGoogle Scholar
- [3.6]B. J. Baliga. Modern Power Devices. J. Wiley and Sons, New York, 1987.Google Scholar
- [3.7]S. K. Banerjee, D. J. Coleman, W. Richardson, and A. Shah. Leakage Mechanism in the Trench Transistor DRAM Cell. IEEE Trans. Electron Devices, ED-35 (1): 108–115, 1988.CrossRefGoogle Scholar
- [3.8]R. Bergmann, S. J. Robinson, Z. Shi, and J. Kurianski. Silicon Films Incorporating a Drift-Field Grown by Liquid Phase Epitaxy for Solar Cell Application. Solar Energy Materials and Solar Cells, 31:447–51, 1993.CrossRefGoogle Scholar
- [3.9]W. Bergner and R. Kircher. Modeling of Band-to-Band Tunneling Mechanisms. Extended Abstracts of the 22nd Conference on Solid State Devices and Materials, Sendai, pp. 135–137, 1990.Google Scholar
- [3.10]D. F. Blossey. Wannier Exciton in an Electric Field. I. Optical Absorption by Bound and Continuum States. Phys. Rev. B, 2(10):3976–90, 1970.CrossRefGoogle Scholar
- [3.11]W. Brauer and H.-W. Streitwolf. Theoretische Grundlagen der Halbleiterphysik. Akademie-Verlag, Berlin, 1977.CrossRefGoogle Scholar
- [3.12]T. P. Brody. On the Nature of the Excess Current in Tunnel Diodes. Bull. Am. Phys. Soc., 6:105, 1961.Google Scholar
- [3.13]M. G. Burt. On the Relation between Static and Adiabatic Coupling Schemes for Calculating Non-radiative Multiphonon Transition Rates. J. Phys. C, 15:L381–L384, 1982.CrossRefGoogle Scholar
- [3.14]C. Canali, C. Jacoboni, F. Nava, G. Ottaviani, and A. Alberigi-Quaranta. Electron Drift Velocity in Silicon. Phys. Rev., B12 (4):2265–84, 1974.Google Scholar
- [3.15]T. Y. Chan, J. Chen, P. K. Ko, and C. Hu. The Impact of Gate-Induced Drain Leakage Current on MOSFET Scaling. IEDM Tech. Digest, Dec.:718–21, 1987.Google Scholar
- [3.16]I.-C. Chen, D. J. Coleman, and C. W. Teng. Gate Current Injection Initiated by Electron Band-to-Band Tunneling in MOS Devices. IEEE Electron Device Letters, EDL-10(7):297–300, 1989.CrossRefGoogle Scholar
- [3.17]W. M. Chen, B. Monemar, E. Janzen, and J. L. Lindström. Direct Observation of Inter-center Charge Transfer in Dominant Nonradiative Recombination Channels in Silicon. Phys. Rev. Lett., 67(14): 1914–17, 1991.CrossRefGoogle Scholar
- [3.18]A. G. Chynoweth. Ionization Rates for Electrons and Holes in Silicon. Phys. Rev., 109(5): 1537–40, 1958.CrossRefGoogle Scholar
- [3.19]A. G. Chynoweth, W. L. Feldmann, and R. A. Logan. Excess Tunnel Current in Silicon Esaki Junctions. Phys. Rev., 121:684–93, 1961.CrossRefGoogle Scholar
- [3.20]A. G. Chynoweth and R. A. Logan. On the Excess Current in Silicon Esaki Junctions. Proc. Int. Conf. Phys. Sem., Prague, Czech. J. Phys., (special publication), pp. 201–203, 1960.Google Scholar
- [3.21]A. G. Chynoweth, R. A. Logan, and D. E. Thomas. Phonon-Assisted Tunneling in Silicon and Germanium Esaki Junctions. Phys. Rev., 125 (3):877–81, 1962.CrossRefGoogle Scholar
- [3.22]A. G. Chynoweth and K. G. McKay. Internal Field Emission in Silicon p-n Junctions. Phys. Rev., 106 (3):418–426, 1957.CrossRefGoogle Scholar
- [3.23]M. L. Cohen and J. R. Chelikowsky. Electronic Structure and Optical Properties of Semiconductors. Springer-Verlag, Berlin Heidelberg New York, 1988.CrossRefGoogle Scholar
- [3.24]A. Cuthbertson and P. Ashburn. Self-Aligned Transistors with Polysilicon Emitters for Bipolar VLSI. IEEE Trans. Electron Devices, ED-32 (2):242–247, 1985.CrossRefGoogle Scholar
- [3.25]J. A. del Alamo and R. M. Swanson. Forward-Bias Tunneling: A Limitation to Bipolar Device Scaling. IEEE Electron Device Letters, EDL-7(11):629–31, 1986.CrossRefGoogle Scholar
- [3.26]C. B. Duke and M. E. Alferieff. Solvable Model of a Hydrogenic System in a Strong Electric Field: Application to Optical Absorption in Semiconductors. Phys. Rev., 145 (2):583–592, 1965.CrossRefGoogle Scholar
- [3.27]C. Duvvury, D. J. Redwine, and H. J. Stiegler. Leakage Current Degradation in N-MOSFETs Due to Hot-Electron Stress. IEEE Electron Dev. Lett., EDL-9 (11):579–81, 1988.CrossRefGoogle Scholar
- [3.28]R. Enderlein, R. Keiper, and W. Tausendfreund. Theory of Stark Effect in Crystals. phys. stat sol., 33:69–83, 1969.CrossRefGoogle Scholar
- [3.29]R. Enderlein and K. Peuker. On the Theory of the Electric Conductivity of Solids in a Strong Electric Field. phys. stat. sol. (b), 48:231–241, 1971.CrossRefGoogle Scholar
- [3.30]R. Enderlein, P. Renner, and M. Scheele. Anisotropy of Electroreflectance Due to Orbital Degeneracy of Energy Bands. phys. stat. sol. (b), 71:503–513, 1975.CrossRefGoogle Scholar
- [3.31]T. Endoh, R. Shirota, M. Momodomi, and F. Masuoka. An Accurate Model of Subbreak-down Due to Band-to-Band Tunneling and Some Applications. IEEE Trans. Electron Devices, ED-37 (1):290–295, 1990.CrossRefGoogle Scholar
- [3.32]L. Esaki. New Phenomenon in Narrow Germanium p-n Junctions. Phys. Rev., 109:603-, 1958.CrossRefGoogle Scholar
- [3.33]L. Esaki and Y. Miyahara. A New Device Using the Tunneling Process in Narrow p-n Junctions. Solid-State Electronics, 1:13–21, 1960.CrossRefGoogle Scholar
- [3.34]R. B. Fair and H. W. Wivell. Zener and Avalanche Breakdown in As-Implanted Low-Voltage Si n-p Junctions. IEEE Trans. Electron Devices, ED-23 (5):512–18, 1976.CrossRefGoogle Scholar
- [3.35]J. G. Fossum and D. S. Lee. A Physical Model for the Dependence of Carrier Lifetime on Doping Density in Nondegenerate Silicon. Solid-State Electronics, 25(8):741–47, 1982.CrossRefGoogle Scholar
- [3.36]J. G. Fossum, R. P. Mertens, D. S. Lee, and J. F. Nijs. Carrier Recombination and Lifetime in Highly Doped Silicon. Solid-State Electronics, 26(6):569–76, 1983.CrossRefGoogle Scholar
- [3.37]W. Franz. Einfluss eines elektrischen Feldes auf eine optische Absorptionskante. Z. Naturforschung, 13a:484–89, 1958.Google Scholar
- [3.38]D. R. Fredkin and G. H. Wannier. Theory of Electron Tunneling in Semiconductor Junctions. Phys. Rev., 128 (5):2054–61, 1962.MathSciNetMATHCrossRefGoogle Scholar
- [3.39]J. Frenkel. On Pre-Breakdown Phenomena in Insulators and Electronic Semi-Conductors. Phys. Rev., 54:647–48, 1938.CrossRefGoogle Scholar
- [3.40]A. M. Frens, M. T. Bennebroek, A. Zakrzewski, J. Schmidt, W. M. Chen, E. Janzen, J. L. Lindström, and B. Monemar. Observation of Rapid Direct Charge Transfer between Deep Defects in Silicon. Phys. Rev. Lett., 72(18):2939–42, 1994.CrossRefGoogle Scholar
- [3.41]L. Fritsche. Phonon Assisted Optical Absorption in an Electric Field. phys. stat. sol., 11:381–400, 1965.CrossRefGoogle Scholar
- [3.42]H. Goebel and K. Hoffmann. Full dynamic power diode model including temperature behavior for use in circuit simulators. In Proceedings of 1992 International Symposium on Power Semiconductor Devices & ICs, pp. 130–135, Tokyo, 1992.Google Scholar
- [3.43]E. Gutsche. Non-Condon Approximations in the Theory of Non-Radiative Multiphonon Transitions. phys. stat. sol. (b), 109:583–596, 1982.CrossRefGoogle Scholar
- [3.44]R. N. Hall. Electron-Hole Recombination in Germanium. Phys. Rev., 87(5):387, 1952.CrossRefGoogle Scholar
- [3.45]R. N. Hall. Observation of Polarons and Phonons During Tunneling in Semiconductor Junctions. Proc. Int. Conf. Phys. Sem., Prague, Czech. J. Phys., (special publication), pp. 193–200, 1960.Google Scholar
- [3.46]A. Hangleiter. Nonradiative Recombination via Deep Impurity Levels in Semiconductors: Experiment. Phys. Rev., B35 (17):9149–61, 1987.Google Scholar
- [3.47]A. Hangleiter. Nonradiative Recombination via Deep Impurity Levels in Semiconductors: The Excitonic Auger Mechanism. Phys. Rev., B37 (5):2594–2604, 1988.Google Scholar
- [3.48]H. Hazama. Anomalous Band-to-Band Tunneling in n-ch MOSFETs. Extended Abstracts of the 22nd Conference on Solid State Devices and Materials, Sendai, pp. 303–306, 1990.Google Scholar
- [3.49]G. Helmis. Strahlungslose Übergänge. Ann. Phys., 19:41–53, 1956.MathSciNetCrossRefGoogle Scholar
- [3.50]K. Henneberger, R. Strehlow, and H.-J. Wünsche. On the Theory of the Interband Conductivity for Forbidden Transitions and Indirect Transitions. phys. stat. sol. (b), 61:455–463, 1974.CrossRefGoogle Scholar
- [3.51]C. H. Henry and D. V. Lang. Nonradiative Capture and Recombination by Multiphonon Emission in GaAs and GaP. Phys. Rev., B15(2):989–1016, 1977.Google Scholar
- [3.52]J. C. Hensel, H. Hasegawa, and M. Nakayama. Cyclotron Resonance in Uniaxially Stressed Silicon. II. Nature of the Covalent Bond. Phys. Rev. A, 138(1):225–38, 1965.Google Scholar
- [3.53]N. Holonyak, Jr., I. A. Lesk, R. N. Hall, J. J. Tiemann, and H. Ehrenreich. Direct Observation of Phonons During Tunneling in Narrow Junction Diodes. Phys. Rev. Lett., 3 (4): 167–68, 1959.CrossRefGoogle Scholar
- [3.54]W. V. Houston. Acceleration of Electrons in a Crystal Lattice. Phys. Rev., 57:184–86, 1940.MathSciNetCrossRefGoogle Scholar
- [3.55]K. Huang. Adiabatic Approximation Theory and Static Coupling Theory of Nonradiative Transitions. Scienta Sinica, XXIV(1):27–34, 1981.Google Scholar
- [3.56]K. Huang and A. Rhys. Theory of Light Absorption and Non-radiative Transitions in F-Centres. Proc. Royal Soc. London, 204 A:406–23, 1950.Google Scholar
- [3.57]G. A. M. Hurkx, D. B. M. Klaassen, M. P. G. Knuvers, and F. G. O’Hara. A New Recombination Model Describing Heavy-Doping Effects and Low-Temperature Behaviour. IEDM Tech. Digest, Dec.:307–10, 1989.Google Scholar
- [3.58]Y. Igura, H. Matsuoka, and E. Takeda. New Device Degradation Due to “Cold” Carriers Created by Band-to-Band Tunneling. IEEE Electron Device Letters, EDL-10(5):227–29, 1989.CrossRefGoogle Scholar
- [3.59]ISE Integrated Systems Engineering AG, Zurich, Switzerland. DESSIS 3.0: Manual, 1996.Google Scholar
- [3.60]H. Jorke, H. Kibbel, K. Strohm, and E. Kasper. Forward-Bias Characteristics of Si Bipolar Junctions Grown by Molecular Beam Epitaxy at Low Temperatures. Appl. Phys. Lett., 63(17):2408–10, 1993.CrossRefGoogle Scholar
- [3.61]E. O. Kane. Zener Tunneling in Semiconductors. J. Phys. Chem. Solids, 12:181–188, 1959.CrossRefGoogle Scholar
- [3.62]E. O. Kane. Theory of Tunneling. J. Appl. Phys., 32 (1):83–91, 1961.MathSciNetMATHCrossRefGoogle Scholar
- [3.63]L. V. Keldysh. Behavior of Non-metallic Crystals in Strong Electric Fields. Soviet Physics JETP, 6(4):763–770, 1958.Google Scholar
- [3.64]L. V. Keldysh. Influence of the Lattice Vibrations of a Crystal on the Production of Electron-Hole Pairs in a Strong Electric Field. Soviet Physics JETP, 7(4):665–669,1958.Google Scholar
- [3.65]H. Köster, Jr., O. V. Kurnusova, and I. N. Yassievich. Tunneling from Deep Levels of l-c Type in Electric Fields. phys. stat. sol.(b), 127:339–350, 1985.CrossRefGoogle Scholar
- [3.66]M. A. Krivoglaz. Zh. Exper. Theor. Fiz., 25:191, 1953.Google Scholar
- [3.67]R. Kubo. Statistical-Mechanical Theory of Irreversible Processes. I. General Theory and Simple Applications to Magnetic and Conduction Problems. J. Phys. Soc. Japan, 12(6):570–86, 1957.MathSciNetCrossRefGoogle Scholar
- [3.68]D. V. Lang, H. G. Grimmeiss, E. Meijer, and M. Jaros. Complex Nature of Gold-related Deep Levels in Silicon. Phys. Rev. B, 22(7):3917–34, 1980.CrossRefGoogle Scholar
- [3.69]P. Lawaetz. Valence-Band Parameters in Cubic Semiconductors. Phys. Rev., B4(10):3460–67, 1971.Google Scholar
- [3.70]U. Lindefeit. ABB Corporate Research, Västerås, Sweden. Private communication.Google Scholar
- [3.71]R. A. Logan and A. G. Chynoweth. Effect of Degenerate Semiconductor Band Structure on Current-Voltage Characteristics of Silicon Tunnel Diodes. Phys. Rev., 131 (1):89–95, 1963.CrossRefGoogle Scholar
- [3.72]G. Lucovski. On the Photoionization of Deep Impurity Centers in Semiconductors. Solid State Comm., 3:299–302, 1965.CrossRefGoogle Scholar
- [3.73]S. Makram-Ebeid and M. Lannoo. Quantum Model for Phonon-Assisted Tunnel Ionization of Deep Levels in a Semiconductor. Phys. Rev., B25:6406–24, 1982.Google Scholar
- [3.74]R. M. Martin. Dielectric Screening Model for Lattice Vibrations of Diamond-Structure Crystals. Phys. Rev., 186 (3):871–884, 1969.CrossRefGoogle Scholar
- [3.75]K. B. McAffee, E. J. Ryder, W. Shockley, and M. Sparks. Observations of Zener Current in Germanium p-n Junctions. Phys. Rev., 83:650–51, 1951.CrossRefGoogle Scholar
- [3.76]K. G. McKay. Avalanche Breakdown in Silicon. Phys. Rev., 94(4):877–84, 1954.CrossRefGoogle Scholar
- [3.77]K. G. McKay and K. B. McAffee. Electron Multiplication in Silicon and Germanium. Phys. Rev., 91(5): 1079–84, 1953.CrossRefGoogle Scholar
- [3.78]S. L. Miller. Avalanche Breakdown in Germanium. Phys. Rev., 99(4): 1234–41, 1955.CrossRefGoogle Scholar
- [3.79]J. R. Morante, J. E. Carceller, P. Cartujo, and J. J. Barbolla. Analysis of Thermal Capture of the Acceptor Level of Gold in Silicon. phys. stat. sol. (b), 111:375–382, 1982.CrossRefGoogle Scholar
- [3.80]N. Mott, E. A. Davis, and H. A. Street. States in the Gap and Recombination in Amorphous Semiconductors. Phil. Mag., 32:961–96, 1975.CrossRefGoogle Scholar
- [3.81]I. Nedev, A. Asenov, and E. Stefanov. Experimental Study and Modeling of Band-to-Band Tunneling Leakage Current in Thin-Oxide MOSFETs. Solid-State Electronics, 34 (12): 1401–08, 1991.CrossRefGoogle Scholar
- [3.82]Y. Odake, K. Kurimoto, and S. Odanaka. Three-Dimensional Numerical Modeling of the Indirect Band-to-Band Tunneling in MOSFETs. Extended Abstracts of the 22nd Conference on Solid State Devices and Materials, Sendai, pp. 131–134, 1990.Google Scholar
- [3.83]R. Pässler. Temperature Dependence of the Nonradiative Multiphonon Carrier Capture and Ejection Properties of Deep Traps in Semiconductors. phys. stat. sol.(b), 85:203–215, 1978.CrossRefGoogle Scholar
- [3.84]Yu. E. Perlin. Consideration of the Polaron Effect in the Theory of Multiphonon Thermal Ionization. Soviet Physics —Solid State, 2(2):222–35, 1960.Google Scholar
- [3.85]K. Peuker, R. Enderlein, A. Schenk, and E. Gutsche. Theory of Non-Radiative Multiphonon Capture Processes. phys. stat. sol.(b), 109:599–606, 1982.CrossRefGoogle Scholar
- [3.86]P. J. Price. Tunneling from Trap States in Esaki Diodes. Bull. Am. Phys. Soc, 5:406–07, 1960.Google Scholar
- [3.87]P. J. Price and J. M. Radcliffe. Esaki Tunneling. IBM Journal, Oct.:364–371, 1959.Google Scholar
- [3.88]B. K. Ridley. Multiphonon, Non-radiative Transition Rate for Electrons in Semiconductors and Insulators. J. Phys. C, 11:2323–41, 1978.CrossRefGoogle Scholar
- [3.89]S. J. Robinson. University of New South Wales, Kensington, Australia. Private communication.Google Scholar
- [3.90]S. J. Robinson, G. F. Zheng, W. Zhang, Z. Shi, and M. A. Green. Opto-Electronic Characterisation of Thin-Film Crystalline Silicon Solar Cells Grown from Metal Solutions. In Ext. Abstracts of the 12th EC PVSEC, Amsterdam, Netherlands, 1994.Google Scholar
- [3.91]C. T. Sah. Electronic Processes in Gold-Doped Silicon Tunnel Diodes. Bull. Am. Phys. Soc., 6:105–106, 1961.Google Scholar
- [3.92]A. Schenk. A Model for the Field and Temperature Dependence of Shockley-Read-Hall Lifetimes in Silicon. Solid-State Electronics, 35(11): 1585–96, 1992.CrossRefGoogle Scholar
- [3.93]A. Schenk. An Improved Approach to the Shockley-Read-Hall Recombination in Inho-mogeneous Fields of Space Charge Regions. J. Appl. Phys., 71(7):3339–49, 1992.CrossRefGoogle Scholar
- [3.94]A. Schenk. Rigorous Theory and Simplified Model of the Band-to-Band Tunneling in Silicon. Solid-State Electronics, 36(1):19–34, 1993.CrossRefGoogle Scholar
- [3.95]A. Schenk, R. Enderlein, and D. Suisky. Field-Dependent Emission Rate at Deep Centers in GaAs by Using a Two Phonon Mode Model. Acta Phys. Polonica, A69:813–816, 1986.Google Scholar
- [3.96]A. Schenk, K. Irmscher, D. Suisky, R. Enderlein, F. Bechstedt, and H. Klose. Electric Field Effect on Multiphonon Transitions at Deep Centres. In J. C. Chadi and W. A. Harrison (eds.), Proc. 17th ICPS, pp. 613–16, San Francisco, 1984. Springer-Verlag, New York Berlin Heidelberg Tokyo.Google Scholar
- [3.97]A. Schenk, U. Krumbein, S. Müller, H. Dettmer, and W. Fichtner. On the Origin of Tunneling Currents in Scaled Silicon Devices. IEICE Trans. on Electronics (Japan), E77-C(2): 148–154, 1994.Google Scholar
- [3.98]A. Schenk, M. Stahl, and H.-J. Wünsche. Calculation of Interband Tunneling in Inho-mogeneous Fields. phys. stat. sol. (b), 154:815–826, 1989.CrossRefGoogle Scholar
- [3.99]A. Schenk, D. Suisky, and R. Enderlein. Nonradiative Transitions in Semiconductors — A General Formula for an n-Mode Model: The Role of Promoting and Accepting Modes. Acta Phys. Polonica, A71:315–317, 1987.Google Scholar
- [3.100]A. Schenk. On the Theory of Nonradiative and Radiative Multiphonon Processes at Deep Centers in an Electric Field (German). PhD thesis, Humboldt-University, Berlin, 1986.Google Scholar
- [3.101]W. Schmid, U. Nieper, and J. Weber. Donor-Acceptor Pair Spectra in Si:In LPE-Layers. Solid State Comm., 45(12): 1007–1011, 1983.CrossRefGoogle Scholar
- [3.102]W. Shockley and W. T. Read. Statistics of the Recombinations of Holes and Electrons. Phys. Rev., 87(5):835–42, 1952.MATHCrossRefGoogle Scholar
- [3.103]J. M. C. Stork and R. D. Isaac. Tunneling in Base-Emitter Junctions. IEEE Trans. Electron Devices, ED-30 (11): 1527–34, 1983.CrossRefGoogle Scholar
- [3.104]N. Strecker, T. Feudel, and W. Fichtner. DIOS: Manual. Technical report, ETH Zurich, Integrated Systems Laboratory, ETH Zentrum, 1992.Google Scholar
- [3.105]Simon M. Sze. Physics of Semiconductor Devices, 2nd ed. John Wiley & Sons, New York, 1981.Google Scholar
- [3.106]M. Takayanagi and S. Iwabuchi. Theory of Band-to-Band Tunneling Under Nonuniform Electric Fields for Subbreakdown Leakage Currents. IEEE Trans. Electron Devices, 38(6): 1425–31, 1991.CrossRefGoogle Scholar
- [3.107]A. F. Tasch and C. T. Sah. Recombination-Generation and Optical Properties of Gold Acceptor in Silicon. Phys. Rev., B1(2):800–09, 1970.Google Scholar
- [3.108]Y. Toyozawa. Multiphonon Recombination Processes. Solid-State Electronics, 21:1313–18, 1978.CrossRefGoogle Scholar
- [3.109]M. S. Tyagi. Zener and Avalanche Breakdown in Silicon Alloyed p-n Junctions. Solid-State Electronics, 11:99–128, 1968.CrossRefGoogle Scholar
- [3.110]M. S. Tyagi and R. J. van Overstraeten. Minority Carrier Recombination in Heavily-Doped Silicon. Solid-State Electronics, 26(6):577–97, 1983.CrossRefGoogle Scholar
- [3.111]V. S. Vavilov, O. G. Koshelev, Yu. P. Koval’, and Ya. G. Klyava. A Study of Inter-Impurity Recombination between Phosphorus and Boron in Silicon. Soviet Physics —Solid State, 8(11):2770–71, 1967.Google Scholar
- [3.112]G. Vincent, A. Chantre, and D. Bois. Electric Field Effect on the Thermal Emission of Traps in Semiconductor Junctions. J. Appl. Phys., 50 (8):5484–87, 1979.CrossRefGoogle Scholar
- [3.113]W. C. Vinogradov. Teorija pogloschenja sveta w postojannom elektritscheskom polje primesnim zentrom s glubokim urovnjem. Fiz. Tver. Tela, 13 (11):3266–74, 1971.Google Scholar
- [3.114]S. H. Voldman, J. B. Johnson, T. D. Linton, and S. L. Titcomb. Unified Generation Model with Donor and Acceptor-Type Trap States for Heavily Doped Silicon. IEDM Tech. Digest, Dec.:349–52, 1990.Google Scholar
- [3.115]Th. Wasserrab. The Temperature Dependence of the Electronic Properties of Intrinsic Silicon. Z. Naturforsch., 32a(7):746–49, 1977.Google Scholar
- [3.116]J. C. S. Woo, J. D. Plummer, and J. M. C. Stork. Non-Ideal Base Current in Bipolar Transistors at Low Temperatures. IEEE Trans. Electron Devices, ED-34(1): 130–38, 1987.CrossRefGoogle Scholar
- [3.117]T. Yajima and L. Esaki. J. Phys. Soc. Japan, 13:1281, 1958.CrossRefGoogle Scholar
- [3.118]J. M. Zener. A General Proof of Certain Fundamental Equations in the Theory of Metallic Conduction. Proc. Roy. Soc., A145(521): 101–117, 1934.Google Scholar