Films with High Dielectric Constants: for Passive Capacitance

  • Takashi Hori
Chapter
Part of the Springer Series in Electronics and Photonics book series (SSEP, volume 34)

Abstract

This chapter describes films having dielectric constants higher than SiO2 that are mainly employed for passive capacitance in DRAM memories. For background information, see Sect. 1.3.

Keywords

High Dielectric Constant Spontaneous Polarization Ferroelectric Material Nonvolatile Memory Breakdown Strength 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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Copyright information

© Springer-Verlag Berlin Heidelberg 1997

Authors and Affiliations

  • Takashi Hori
    • 1
  1. 1.Kyoto Research LaboratoryMatsushita Electronics, Inc.Minami-ku,KyotoJapan

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