Oxidation, Nitridation, and Reduction

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Abstract

Surface oxidation of metals and semiconductors in an oxidizing agent is a well-known phenomenon. Clean surfaces of many materials such as Al, Nb, Si, etc., spontaneously react in air, even at room temperature, to form thin native oxide layers. With the materials under consideration the native oxide layer is very dense and terminates further oxidation. Native oxide layers are, typically, 10–100Å thick.

Keywords

Oxide Layer Oxidation Rate Oxide Growth Oxidic Perovskite Thin Metal Film 
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© Springer-Verlag Berlin Heidelberg 2011

Authors and Affiliations

  1. 1.Johannes-Kepler-Universität Linz, Inst. Angewandte PhysikLinzAustria

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