Ultrafast Extreme Ultraviolet Holography: Dynamic Monitoring of Surface Deformation

  • Ra’anan I. Tobey
  • Mark E. Siemens
  • Oren Cohen
  • Qing Li
  • Margaret M. Murnane
  • Henry C. Kapteyn
  • Keith A. Nelson
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 88)

Abstract

We extend the use of Gabor Holography with Extreme Ultraviolet (EUV) Radiation to study surface deformations on ultrafast timescales. The use of EUV light allows for surface sensitive probing with sub-Angstrom displacement resolution and sub-100fs time resolution.

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References

  1. [1]
    V.V. Tenemov, et. al., Applied Physics A 78: 483–489 (2004).Google Scholar
  2. [2]
    D.J. Funk, et. al., Applied Physics A 81: 295–302 (2005).ADSGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2007

Authors and Affiliations

  • Ra’anan I. Tobey
    • 1
  • Mark E. Siemens
    • 1
  • Oren Cohen
    • 1
  • Qing Li
    • 1
  • Margaret M. Murnane
    • 1
  • Henry C. Kapteyn
    • 1
  • Keith A. Nelson
    • 2
  1. 1.Department of Physics and JILAUniversity of ColoradoBoulder
  2. 2.Department of ChemistryMassachusetts Institute of TechnologyCambridge

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