Shock Waves pp 591-596 | Cite as

Kinetics of the gas phase reaction of SnO with O2

  • J. Herzler
  • M. Kennedy
  • F. E. Kruis
  • P. Roth
Conference paper


The gas phase reaction of SnOg with O2 was studied behind reflected shock waves at temperatures between 1700 and 2300 K and pressures around 100 kPa by applying atomic resonance absorption spectroscopy for time-resolved measurements of O atoms at 130.6 nm. The source of gas phase SnOg were SnO nanoparticles which rapidly evaporate behind the reflected shock wave in a few microseconds. For the reaction SnOg+O2→SnO2,g+O a rate coefficient of k1=1014.78±0.19 × exp(−23530±840K/T)cm3 mol−1 s−1 was determined for the temperature range of the present experiments.


Shock Tube Rate Coefficient Reflected Shock Wave Drive Section Sandia National Laboratory Report 
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  1. 1.
    Z. M. Jarzebski, J. P. Marton: J. Electrochem. Soc. 2, 199C (1976)CrossRefGoogle Scholar
  2. 2.
    K. Takahashi, A. Giesen, and P. Roth: Phys. Chem. Chem. Phys. 3, 4296 (2001)CrossRefGoogle Scholar
  3. 3.
    K. Takahashi, A. Kunz, D. Woiki, and P. Roth: J. Phys. Chem. A 104, 5246 (2000)CrossRefGoogle Scholar
  4. 4.
    A. Kunz, K. Takahashi, R. Roth, and L. Catoire: In: Proceedings of the 22nd Int. Symp. on Shock Waves, (Univ. of Southampton Press, Southampton 2000) pp.117Google Scholar
  5. 5.
    R. E. Mitchell and R. J. Kee: A general-purpose computer code for predicting chemical behavior behind incident and reflected shocks. Sandia National Laboratories Report No. SAND82-8205. Sandia National Laboratories, Livermore CA (1982)Google Scholar
  6. 6.
    R. J. Kee, F. M. Rupley, and J. A. Miller: Chemkin-II: A fortran chemical kinetics package for the analysis of gas-phase chemical kinetics. Sandia National Laboratories Report No. SAND89-8009. Sandia Laboratories, Albuquerque NM (1993)Google Scholar
  7. 7.
    D. P. Belyung, A. Fontijn: J. Phys. Chem. 99, 12225 (1995).CrossRefGoogle Scholar
  8. 8.
    F. Westley, D. H. Frizzell, J. T. Herron, F. J. Hampson, and W. G. Mallard: The NIST chemical kinetics database. National Institute of Satandards and Technology, Gaithersburg MD NIST Standard Reference Database 17 — 2Q98 (1998)Google Scholar
  9. 9.
    L. V. Gurvich (ed.): In: Thermodynmic Properties of Individual Substances, Vol 2. Elements C, Si, Ge, Sn, Pb, and their compounds, Tables, 4. ed., rev. and updated from the 3. Russian ed., (Hemisphere Publ. Corp., New York 1991)Google Scholar

Copyright information

© Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2005

Authors and Affiliations

  • J. Herzler
    • 1
  • M. Kennedy
    • 2
  • F. E. Kruis
    • 2
  • P. Roth
    • 1
  1. 1.Institut für Verbrennung und GasdynamikUniversität Duisburg-EssenDuisburgGermany
  2. 2.Prozeß- und AerosolmeßtechnikUniversität Duisburg-EssenDuisburgGermany

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