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TCAD Simulation of Amorphous Indium-Gallium-Zinc Oxide Thin-Film Transistors

  • Jorge Martins
  • Pedro Barquinha
  • João Goes
Part of the IFIP Advances in Information and Communication Technology book series (IFIPAICT, volume 470)

Abstract

Indium-gallium-zinc oxide (IGZO) thin-film transistors (TFTs) are simulated using TCAD software. Nonlinearities observed in fabricated devices are obtained through simulation and corresponding physical characteristics are further investigated. For small channel length (below 1 µm) TFTs’ simulations show short channel effects, namely drain-induced barrier lowering (DIBL), and effectively source-channel barrier is shown to decrease with drain bias. Simulations with increasing shallow donor-like states result in transfer characteristics presenting hump-like behavior as typically observed after gate bias stress. Additionally, dual-gate architecture is simulated, exhibiting threshold voltage modulation by the second gate biasing.

Keywords

IGZO TCAD simulation DOS TFT CPS 

Notes

Acknowledgements

This work is funded by FEDER funds through the COMPETE 2020 Programme and National Funds through FCT - Portuguese Foundation for Science and Technology under the Project Nos. UID/CTM/50025/2013 and EXCL/CTM-NAN/0201/2012. The work has also received funding from the European Communities 7th Framework Programme under grant agreement ICT-2013-10-611070 (i-FLEXIS project) and from H2020 program under ICT-03-2014-644631 (ROLL-OUT project).

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Copyright information

© IFIP International Federation for Information Processing 2016

Authors and Affiliations

  1. 1.i3N/CENIMAT, Department of Materials Science, Faculty of Science and TechnologyUniversidade NOVA de Lisboa and CEMOP/UNINOVA, Campus de CaparicaCaparicaPortugal
  2. 2.CTS-UNINOVA, Departamento de Engenharia Electrotécnica, Faculdade de Ciências e TecnologiaUniversidade Nova de LisboaCaparicaPortugal

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