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Overview of Application Instrumentation for Performance Analysis and Tuning

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Parallel Processing and Applied Mathematics (PPAM 2019)

Part of the book series: Lecture Notes in Computer Science ((LNTCS,volume 12044))

Abstract

Profiling and tuning of parallel applications is an essential part of HPC. Analysis and improvement of the hot spots of an application can be done using one of many available tools, that provides measurement of resources consumption for each instrumented part of the code. Since complex applications show different behavior in each part of the code, it is desired to insert instrumentation to separate these parts.

Besides manual instrumentation, some profiling libraries provide different ways of instrumentation. Out of these, the binary patching is the most universal mechanism, that highly improves user-friendliness and robustness of the tool. We provide an overview of the most often used binary patching tools and show a workflow of how to use them to implement a binary instrumentation tool for any profiler or autotuner. We have also evaluated the minimum overhead of the manual and binary instrumentation.

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Notes

  1. 1.

    OpenHPC project list of performance analysis tools besides mentioned libraries contain tools without API (e.g. visualization libraries) and also PAPI [26].

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Acknowledgment

This work was supported by The Ministry of Education, Youth and Sports from the Large Infrastructures for Research, Experimental Development and Innovations project IT4Innovations National Supercomputing Center LM2015070. This work was supported by the Moravian-Silesian Region from the programme “Support of science and research in the Moravian-Silesian Region 2017” (RRC/10/2017). This work was also partially supported by the SGC grant No. SP2019/59 “Infrastructure research and development of HPC libraries and tools”, VŠB - Technical University of Ostrava, Czech Republic.

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Authors and Affiliations

  1. IT4Innovations National Supercomputing Center, VŠB – Technical University of Ostrava, Ostrava, Czech Republic

    Ondrej Vysocky & Lubomir Riha

  2. University of Bologna, DEI, via Risorgimento 2, 40136, Bologna, Italy

    Andrea Bartolini

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  1. Ondrej Vysocky
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  2. Lubomir Riha
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  3. Andrea Bartolini
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Correspondence to Ondrej Vysocky .

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Editors and Affiliations

  1. Czestochowa University of Technology, Czestochowa, Poland

    Roman Wyrzykowski

  2. University of Southern California, Marina del Rey, CA, USA

    Ewa Deelman

  3. University of Tennessee, Knoxville, TN, USA

    Jack Dongarra

  4. Czestochowa University of Technology, Czestochowa, Poland

    Konrad Karczewski

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Vysocky, O., Riha, L., Bartolini, A. (2020). Overview of Application Instrumentation for Performance Analysis and Tuning. In: Wyrzykowski, R., Deelman, E., Dongarra, J., Karczewski, K. (eds) Parallel Processing and Applied Mathematics. PPAM 2019. Lecture Notes in Computer Science(), vol 12044. Springer, Cham. https://doi.org/10.1007/978-3-030-43222-5_14

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  • DOI: https://doi.org/10.1007/978-3-030-43222-5_14

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  • Online ISBN: 978-3-030-43222-5

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