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1-D Fluid Modeling of Methane Dissociation in Radiofrequency Capacitively Coupled Plasma

  • Abdelatif GadoumEmail author
  • Djilali Benyoucef
  • Mohamed Habib Allah Lahoual
Conference paper
Part of the Lecture Notes in Networks and Systems book series (LNNS, volume 62)

Abstract

The use of the hydrogen gas as a fuel for the energy produced by fuel cells is increasingly being studied in several areas. Among techniques of hydrogen production is the dissociation of methane in cold plasma. This work represents the modelling of methane dissociation in radio frequency capacitively coupled plasma by using fluid model, and by considering 21 species (i.e. in total; neutrals, radicals, ions, and electrons) and more than 30 reactions (electronic impact with CH4, neutral-neutral, neutral-ions and surface reactions).

Keywords

Radiofrequency capacitively coupled plasma Fluid model Methane Hydrogen 

References

  1. 1.
    Benyoucef, D., Yousfi, M.: Particle modelling of magnetically confined oxygen plasma in low pressure radio frequency discharge. Phys. Plasmas 22(1), 013510 (2015)CrossRefGoogle Scholar
  2. 2.
    Benyoucef, D.: Modélisation particulaire et multidimensionnelle des décharges hors équilibre à basse pression excitées par champs électromagnétiques. Diss. Université de Toulouse, Université Toulouse III-Paul Sabatier, 2011Google Scholar
  3. 3.
    Liu, X., Shemansky, D.E.: Analysis of electron impact ionization properties of methane. J. Geophys. Res. Space Phys. 111(A4), 29–33 (2006)Google Scholar
  4. 4.
    Mao, M., Bogaerts, A.: Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: the effect of different gas mixtures. J. Phys. D Appl. Phys. 43(20), 205201 (2010)CrossRefGoogle Scholar
  5. 5.
    Davies, D.K., Kline, L.E., Bies, W.E.: Measurements of swarm parameters and derived electron collision cross sections in methane. J. Appl. Phys. 65(9), 3311–3323 (1989)CrossRefGoogle Scholar
  6. 6.
    Wei, B., et al.: The relative cross section and kinetic energy distribution of dissociation processes of methane by electron impact. J. Phys. B: At. Mol. Opt. Phys. 46(21), 215205 (2013)CrossRefGoogle Scholar
  7. 7.
    Snoeckx, R., et al.: Influence of N2 concentration in a CH4/N2 dielectric barrier discharge used for CH4 conversion into H2. Int. J. Hydrog. Energy 38(36), 16098–16120 (2013)CrossRefGoogle Scholar
  8. 8.
    Ziółkowski, M., et al.: Modeling the electron-impact dissociation of methane. J. Chem. Phys. 137(22), 22A510 (2012)CrossRefGoogle Scholar
  9. 9.
    Donkó, Z., et al.: Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments. Plasma Phys. Control. Fusion 54(12), 124003 (2012)CrossRefGoogle Scholar
  10. 10.
    Herrebout, D., Bogaerts, A., Yan, M., Gijbels, R., Goedheer, W., Dekempeneer, E.: One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers. J. Appl. Phys. 90(2), 570–579 (2001)CrossRefGoogle Scholar
  11. 11.
    Herrebout, D., et al.: One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers. J. Appl. Phys. 90(2), 570–579 (2001)CrossRefGoogle Scholar
  12. 12.
    http://kida.obs.u-bordeaux1.fr. Accessed 22 Jan 2018
  13. 13.
  14. 14.
  15. 15.
    Boeuf, J.P., Pitchford, L.C.: Two-dimensional model of a capacitively coupled RF discharge and comparisons with experiments in the gaseous electronics conference reference reactor. Phys. Rev. E 51(2), 1376 (1995)CrossRefGoogle Scholar
  16. 16.
    Tachibana, K., et al.: Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon films. J. Phys. D Appl. Phys. 17(8), 1727 (1984)CrossRefGoogle Scholar
  17. 17.
    Chang, C.-W., Davoudabadi, M., Mashayek, F.: One-dimensional fluid model of methane plasma for diamond-like coating. IEEE Trans. Plasma Sci. 38(7), 1603–1614 (2010)CrossRefGoogle Scholar
  18. 18.
    Rhallabi, A., Catherine, Y.: Computer simulation of a carbon-deposition plasma in CH/sub 4. IEEE Trans. Plasma Sci. 19(2), 270–277 (1991)CrossRefGoogle Scholar

Copyright information

© Springer Nature Switzerland AG 2019

Authors and Affiliations

  • Abdelatif Gadoum
    • 1
    Email author
  • Djilali Benyoucef
    • 1
  • Mohamed Habib Allah Lahoual
    • 1
  1. 1.Laboratoire Génie Electrique et Energies RenouvelablesChlef UniversityChlefAlgeria

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