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Processing Techniques

  • Barbara CorteseEmail author
  • Luciano Velardi
  • Ilaria Elena Palamà
  • Stefania D’Amone
  • Eliana D’Amone
  • Gianvito de Iaco
  • Diego Mangiullo
  • Giuseppe Gigli
Chapter

Abstract

The semiconductor industry is nowadays under constant pressure to produce devices which are cheaper, smaller, more powerful, and efficient. Moreover, current advances in the production of thin layers have made a whole new range of devices manufacturable. Thin films on substrates are generally prepared using bulk growth methods or physical vapor deposition (PVD) and chemical vapor deposition (CVD). Growth and processing techniques of materials including semiconductors are reviewed in this chapter.

Keywords

Semiconductor Industry Devices Thin Films Physical Vapor Deposition Chemical Vapor Deposition Czochralski Technique Float-Zone Crystal Growth Epitaxy Diffusion Ion Implantation Self-Assembly RCA Cleaning Vacuum Deposition 

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Copyright information

© Springer Nature Switzerland AG 2019

Authors and Affiliations

  • Barbara Cortese
    • 1
    Email author
  • Luciano Velardi
    • 2
  • Ilaria Elena Palamà
    • 3
  • Stefania D’Amone
    • 3
  • Eliana D’Amone
    • 3
  • Gianvito de Iaco
    • 3
  • Diego Mangiullo
    • 3
  • Giuseppe Gigli
    • 3
    • 4
    • 5
  1. 1.Nanotechnology Institute, CNR-NANOTECUniversity La SapienzaRomeItaly
  2. 2.P.LAS.M.I Lab@Bari, Nanotechnology Institute, CNR-NANOTECBariItaly
  3. 3.Nanotechnology Institute, CNR-NANOTECLecceItaly
  4. 4.Department Matematica e Fisica ‘Ennio De Giorgi’University of SalentoLecceItaly
  5. 5.Italian Institute of Technology (IIT)—Center for Biomolecular NanotechnologiesArnesanoItaly

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