Microstructure Evolution and Process Control

Chapter
Part of the Engineering Materials and Processes book series (EMP)

Abstract

A CVD process is very complex, many ignore chemical reactions and involves. To this day, it is still very difficult or impossible to identify the reactant species and reaction paths during a CVD process at high temperature by experimental methods. Meanwhile, various physical and chemical phenomena are involved in the deposition process. For a CVD process, these phenomena include [1]: (1) heat transfer from the heating element to the substrate to activate the chemical reactions, (2) mass transport in the bulk gas and boundary layer, (3) adsorption and migration of the reactant gaseous species on the surface of the substrate, as well as the desorption of the by-product gaseous species, and (4) solid product formation from the homogeneous and heterogeneous chemical reactions. Furthermore, the situation becomes much more complex because these phenomena are always interacting with each other.

Keywords

Computational Fluid Dynamic Chemical Vapour Deposition Microstructure Evolution Reaction Chamber Computational Fluid Dynamic Analysis 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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