Real-time Monitoring of a Pulsed Power for Reactive Magnetron Sputtering Using a LabVIEW System
Abstract
Due to a pulsed power offering the instant energy for extremely high plasma density, the purpose of this study is to develop the real-time monitoring system for the modern pulsed plasma coating by the LabVIEW technique. One selected exampl of the thin-film formation was testified based upon various N2 gas flows for depositing ZrNx film on the substrate of a p-type (100) silicon wafer through pulsed-DC reactive magnetron sputtering. The results indicate that the specific pulsed parameters affect the crystallized status on the ZrNx film, in which a pulsed power was monitored by a LabVIEW system. Also, the characteristics of ZrN films in crystal orientations and grain sizes have directly relationship to various N2 flow rates.
Keywords
Reactive sputtering pulsed magnetron coating zirconium-nitride film layer characterizationPreview
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