Tetrahedrally-Bonded Amorphous Semiconductors pp 233-238 | Cite as
On the Nature of Gap States in Hydrogenated Amorphous Silicon Alloys
Abstract
Study of localized states within the mobility gap of hydrogenated amorphous silicon alloys (a-Si:H) has received a great deal of attention in recent years. A simple energy distribution for the gap states was first suggested by Mott1 where, in addition to the band tails caused by disorder, as proposed by Cohen, Fritzsche and Ovshinsky2, there were states in the gap due to defects in the material. A specific defect center, namely a dangling bond, was proposed and it was suggested, depending on the occupancy, it may give rise to two bands separated by an appropriate correlation energy. Spear3 suggested that there could be other defects, e.g., divacancies, giving rise to states in the gap. Since a-Si:H alloys contain many impurities at the level of 1018cm−3 or higher4, these impurities may form complexes with the inherent defects and give rise to a wide distribution of gap states.
Keywords
Crystalline Silicon Dangling Bond Amorphous Semiconductor Wide Energy Range Band TailPreview
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